⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704254 | 0.94 | HRH3 (0.35) | — | |
| SCHEMBL27646927 | 0.92 | HRH3 (0.34) | — | |
| SCHEMBL6331157 | 0.92 | HRH3 (0.34) | — | |
| SCHEMBL8667497 | 0.90 | HRH3 (0.40) | — | |
| SCHEMBL8670146 | 0.85 | HRH3 (0.40) | — | |
| SCHEMBL8665463 | 0.85 | HRH3 (0.42) | — | |
| SCHEMBL706505 | 0.81 | — | — | |
| SCHEMBL703126 | 0.78 | — | — | |
| SCHEMBL8665138 | 0.78 | HRH3 (0.41) | — | |
| SCHEMBL4580892 | 0.77 | TDP1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-100354319-C | Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer | TAIWAN RUBBER CO LTD (CN) | 2007-12-12 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1781955-A | Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer | TAIWAN RUBBER CO LTD (CN) | 2006-06-07 | — | — | CN | disclosed |
| EP-0761700-B1 | Propylene-ethylene random copolymer, process for producing the same and film thereof | SUMITOMO CHEMICAL CO (JP) | 2000-07-05 | — | — | EP | disclosed |
| US-6057413-A | HEAT SEALING FILM WITH HAZE FORMED BY MELT EXTRUSION OF COPOLYMER IN THE ABSENCE OF SOLVENT IN THE PRESENCE OF CATALYST | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-02 | — | — | US | disclosed |
| EP-0761700-A2 | Propylene-ethylene random copolymer, process for producing the same and film thereof | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1997-03-12 | — | — | EP | disclosed |