⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704254 | 0.81 | HRH3 (0.35) | — | |
| SCHEMBL704052 | 0.81 | — | — | |
| SCHEMBL27646927 | 0.79 | HRH3 (0.34) | — | |
| SCHEMBL6331157 | 0.79 | HRH3 (0.34) | — | |
| SCHEMBL706721 | 0.75 | — | — | |
| SCHEMBL8667497 | 0.73 | HRH3 (0.40) | — | |
| SCHEMBL8670146 | 0.73 | HRH3 (0.40) | — | |
| SCHEMBL8665463 | 0.73 | HRH3 (0.42) | — | |
| SCHEMBL11655700 | 0.73 | ALDH1A1 (0.30) | — | |
| SCHEMBL3481801 | 0.73 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-62022790-A | — | — | None | — | — | JP | disclosed |
| EP-2457917-B1 | Silanol-containing triarylamine derivatives | SHINETSU CHEMICAL CO (JP) | 2014-06-18 | — | — | EP | disclosed |
| US-8575384-B2 | Silanol-containing triarylamine derivatives | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20120149913-A1 | SILANOL-CONTAINING TRIARYLAMINE DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| EP-2457917-A1 | Silanol-containing triarylamine derivatives | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-05-30 | — | — | EP | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0657473-B1 | Alpha-olefin polymerization catalyst system and process for producing alpha-olefin catalyst | SUMITOMO CHEMICAL CO (JP) | 1999-04-21 | — | — | EP | disclosed |
| US-5608018-A | CONTAINING TRIVALENT TITANIUM COMPOUND MADE BY REDUCING A TETRAVALENT HYDROCARBYLOXYTITANIUM COMPOUND MIXED WITH ORGANOSILOXY COMPOUND AND ESTER BY MEANS OF ORGANOMAGNESIUM COMPOUND, ESTER-TREATING AND ETHER-TICL4-TREATING PRODUCT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-03-04 | — | — | US | disclosed |
| EP-0657473-A2 | Alpha-olefin polymerization catalyst system and process for producing alpha-olefin catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-06-14 | — | — | EP | disclosed |
| EP-0259124-A2 | Method of polymerizing alpha olefins | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1988-03-09 | — | — | EP | disclosed |
| JP-S6222790-A | PRODUCTION OF TERTIARY HYDROCARBONSILYL COMPOUND | SHIN ETSU CHEM CO LTD | 1987-01-30 | — | — | JP | disclosed |