SCHEMBL704145

SCHEMBL704145

CC(C)(C)[Si](Oc1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA4 P22748 1/20 0.37
LTA4H P09960 2/20 0.35
TSHR P16473 1/20 0.35
MAPK1 P28482 1/20 0.33
RIPK1 Q13546 1/20 0.32
ALDH1A1 P00352 1/20 0.31
ALOX15 P16050 1/20 0.31
ATM Q13315 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
ESR1 P03372 1/20 0.30
ESR2 Q92731 1/20 0.30
KCNA3 P22001 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27600931 0.88 CA4 (0.46) CA4LTA4HALDH1A1L3MBTL1
SCHEMBL20594005 0.87
SCHEMBL7096596 0.87 ESR2 (0.46) CA4LTA4HALDH1A1ESR1ESR2
SCHEMBL6058734 0.87 ALDH1A1 (0.37) TSHRMAPK1ALDH1A1
SCHEMBL17233741 0.87 SMN1; SMN2 (0.46) ALDH1A1L3MBTL1ESR1ESR2SMN1; SMN2
SCHEMBL7424773 0.87 MAOA (0.44) TSHRMAPK1ALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL7092637 0.84 CYP3A4 (0.42) TSHRALDH1A1ESR1ESR2
SCHEMBL5236553 0.83 CA4 (0.40) CA4LTA4HTSHRMAPK1ALDH1A1
SCHEMBL25414124 0.82 ALDH1A1 (0.41) TSHRALDH1A1L3MBTL1
SCHEMBL9479294 0.82 CSF1R (0.36) MAPK1ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109354662-A Anti-infection material for built-in hemodialysis tube and preparation method thereof 湖南博隽生物医药有限公司 2019-02-19 CN claimed
CN-109354662-A Anti-infection material for built-in hemodialysis tube and preparation method thereof 湖南博隽生物医药有限公司 2019-02-19 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
CN-1278252-A 4, 5-diaryl oxazole compound FUJISAWA PHARMACEUTICAL CO (JP) 2000-12-27 CN disclosed