SCHEMBL704367

SCHEMBL704367

CO[SiH2]C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7160157 0.75 ALDH1A1 (0.33)
SCHEMBL461524 0.70
SCHEMBL9690930 0.70
SCHEMBL7103116 0.69
SCHEMBL7625756 0.67
SCHEMBL996898 0.65
SCHEMBL7572902 0.65
SCHEMBL2110312 0.64
SCHEMBL1051452 0.64
SCHEMBL2110357 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12583222-B2 Solvent compatible nozzle plate BRADY WORLDWIDE, INC. (US) 2026-03-24 US claimed
US-20240198675-A1 SOLVENT COMPATIBLE NOZZLE PLATE FUNAI ELECTRIC CO., LTD. (JP) 2024-06-20 US claimed
US-11958292-B2 Solvent compatible nozzle plate FUNAI ELECTRIC CO., LTD. (JP) 2024-04-16 US claimed
CN-115113480-A Composite photoresist material, preparation method thereof and fluid ejection head 船井电机株式会社 2022-09-27 CN claimed
US-20220297428-A1 Solvent Compatible Nozzle Plate FUNAI ELECTRIC CO., LTD. (JP) 2022-09-22 US claimed
US-20220301862-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2022-09-22 US claimed
EP-4060406-A2 COMPOSITE PHOTORESIST MATERIAL AND METHOD FOR MAKING THEREOF, AND FLUID EJECTION HEAD Funai Electric Co., Ltd. (JP) 2022-09-21 EP claimed
EP-4018013-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM Versum Materials US, LLC (US) 2022-06-29 EP claimed
WO-2021050659-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2021-03-18 WO claimed
US-10599034-B2 Method for manufacturing MEMS devices and nano devices with varying degrees of hydrophobicity and hydrophilicity in a composite photoimageable dry film FUNAI ELECTRIC CO., LTD. (JP) 2020-03-24 US claimed
US-6465670-B2 SURFACE TREATMENT USING ORGANOSILICON COMPOUND, SOLVENT AND PHASE TRANSFER CATALYST THE GOODYEAR TIRE & RUBBER COMPANY 2002-10-15 US claimed
US-20020022085-A1 Preparation of surface modified silica GOODYEAR TIRE & RUBBER COMPANY, THE 2002-02-21 US claimed
US-12600130-B2 Ejection head nozzle flooding control BRADY WORLDWIDE, INC. (US) 2026-04-14 US disclosed
US-12583222-B2 Solvent compatible nozzle plate BRADY WORLDWIDE, INC. (US) 2026-03-24 US disclosed
EP-4674624-A1 NOZZLE PLATE, FLUID EJECTION HEAD, FLUID EJECTION DEVICE, AND MODIFYING METHOD OF NOZZLE PLATE Brady Worldwide, Inc. (US) 2026-01-07 EP disclosed
US-20250065624-A1 EJECTION HEAD NOZZLE FLOODING CONTROL FUNAI ELECTRIC CO., LTD. (JP) 2025-02-27 US disclosed
EP-0238663-B1 POLYESTER FILM WITH SMOOTH AND HIGHLY ADHESIVE SURFACE AND METHOD OF MAKING SAME TORAY INDUSTRIES, INC. (JP) 1989-04-12 EP disclosed
US-4732814-A MAGNETIC RECORDING MEDIA TORAY INDUSTRIES, INC. (JP) 1988-03-22 US disclosed
EP-0238663-A1 POLYESTER FILM WITH SMOOTH AND HIGHLY ADHESIVE SURFACE AND METHOD OF MAKING SAME. TORAY INDUSTRIES (JP) 1987-09-30 EP disclosed
WO-1987002172-A1 POLYESTER FILM WITH SMOOTH AND HIGHLY ADHESIVE SURFACE AND METHOD OF MAKING SAME TORAY INDUSTRIES, INC. (JP) 1987-04-09 WO disclosed