SCHEMBL7044005

SCHEMBL7044005

Fc1c(F)c(F)c2ccc[c]c2c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7720990 1.00
SCHEMBL18393659 0.73 KDM4E (0.32)
SCHEMBL2409495 0.71 CYP2A6 (0.33)
SCHEMBL1392354 0.69
SCHEMBL24104 0.69 HPRT1 (0.35)
SCHEMBL2407351 0.69 HPRT1 (0.35)
SCHEMBL4824194 0.69 HPRT1 (0.35)
SCHEMBL1392207 0.67
SCHEMBL30366320 0.67 ALDH1A1 (0.39)
SCHEMBL2887670 0.67 ALDH1A1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
US-20240201593-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
WO-2024063044-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM 日産化学株式会社 2024-03-28 WO disclosed
US-20240069441-A1 COMPOSITION FOR RESIST UNDERLYING FILM FORMATION NISSAN CHEMICAL CORPORATION (JP) 2024-02-29 US disclosed
WO-2024019064-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID 日産化学株式会社 2024-01-25 WO disclosed
WO-2024009993-A1 METHOD OF MANUFACTURING LAMINATE AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT 日産化学株式会社 2024-01-11 WO disclosed
WO-2023136250-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND SILICON-CONTAINING RESIST UNDERLAYER FILM 日産化学株式会社 2023-07-20 WO disclosed
US-20230176481-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-06-08 US disclosed
US-20230168582-A1 COMPOSITION FOR FORMING RESIST UNDERLYING FILM NISSAN CHEMICAL CORPORATION (JP) 2023-06-01 US disclosed
US-20230152700-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-05-18 US disclosed
EP-1296991-B1 SILOXY SUBSTITUTED COCATALYST ACTIVATORS FOR OLEFIN POLYMERIZATION EXXONMOBIL CHEM PATENTS INC (US) 2013-05-15 EP disclosed
CN-1178960-C Siloxy substituted cocatalyst activators for olefin polymerization 埃克森美孚化学专利公司 2004-12-08 CN disclosed
CN-1172964-C Nitrogen-containing group 13 anionic compound for olefin polymerization ����ɭ���ڻ�ѧר����˾ 2004-10-27 CN disclosed
CN-1437607-A Siloxy substituted cocatalyst activators for olefin polymerization EXXONMOBIL CHEM PATENTS INC (US) 2003-08-20 CN disclosed
CN-1430673-A Cestrum yellow leaf curling virus promoters SYNGENTA PARTICIPATIONS AG (CH) 2003-07-16 CN disclosed
CN-1427849-A Nitrogen-Containing group-13 anionic compounds for olefin polymerization EXXONMOBIL CHEM PATENTS INC (US) 2003-07-02 CN disclosed
EP-1296991-A1 SILOXY SUBSTITUTED COCATALYST ACTIVATORS FOR OLEFIN POLYMERIZATION ExxonMobil Chemical Patents Inc. (US) 2003-04-02 EP disclosed
EP-1297027-A1 SILOXY SUBSTITUTED COCATALYST ACTIVATORS FOR OLEFIN POLYMERIZATION Exxonmobil Chemical Patents Inc. (US) 2003-04-02 EP disclosed
WO-2002000738-A1 SILOXY SUBSTITUTED COCATALYST ACTIVATORS FOR OLEFIN POLYMERIZATION EXXONMOBIL CHEMICAL PATENTS INC. (US) 2002-01-03 WO disclosed
WO-2002000666-A1 SILOXY SUBSTITUTED COCATALYST ACTIVATORS FOR OLEFIN POLYMERIZATION EXXONMOBIL CHEMICAL PATENTS INC. (US) 2002-01-03 WO disclosed