Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | TSHR | P16473 | 5/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | CA3 | P07451 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3179892 | 0.82 | CA1 (0.35) | TDP1CA1CA2CYP3A4 | |
| SCHEMBL105508 | 0.69 | TDP1 (0.37) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL2058398 | 0.69 | APP (0.37) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL8957510 | 0.69 | TSHR (0.39) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL3656463 | 0.69 | ALDH1A1 (0.35) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| Hydrochloric Acid SCHEMBL7156392 | 0.67 | CA4 (0.37) | ALDH1A1TSHRTDP1CA1CA2 | |
| Water SCHEMBL6847549 | 0.64 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1ALOX12CA1 | |
| SCHEMBL1696973 | 0.61 | — | — | |
| SCHEMBL7712811 | 0.61 | — | — | |
| Biphenyl SCHEMBL8769842 | 0.61 | ALDH1A1 (0.82) | ALDH1A1TDP1CA1CA2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4429872-A1 | VAT POLYMERIZATION PROCESS | Polyfos 3D Ltd (IL) | 2024-09-18 | — | — | EP | claimed |
| EP-3741786-B1 | METHOD FOR PRODUCTION OF PRESSURE-SENSITIVE SELF-ADHESIVE, ADHESIVE BASED ON AN ETHOXYLATED SILANE CONTAINING POLYMER, ADHESIVE PRODUCED BY THE METHOD, AND USE THEREOF | COROPLAST FRITZ MUELLER GMBH & CO KG (DE) | 2024-04-10 | — | — | EP | claimed |
| CN-117106128-A | Fluorine-containing acrylate polymer, preparation method thereof, fluorinated polymer photoresist material and application thereof | 吉林大学 | 2023-11-24 | — | — | CN | claimed |
| WO-2023084517-A1 | VAT POLYMERIZATION PROCESS | POLYFOS 3D LTD (IL) | 2023-05-19 | — | — | WO | claimed |
| US-20220228034-A1 | METHOD FOR PRODUCING A PRESSURE-SENSITIVE ADHESIVE BASED ON AN ALKOXYLATED, IN PARTICULAR ETHOXYLATED, SILANE-CONTAINING POLYMER, PRESSURE-SENSITIVE ADHESIVE PRODUCED ACCORDING TO THIS METHOD, AND USE THEREOF | COROPLAST FRITZ MÜLLER GMBH & CO. KG (DE) | 2022-07-21 | — | — | US | claimed |
| EP-1380895-B1 | Chemically amplified resist material | FUJITSU LTD (JP) | 2018-07-04 | — | — | EP | claimed |
| US-20250010542-A1 | VAT POLYMERIZATION PROCESS | POLYFOS 3D LTD (IL) | 2025-01-09 | — | — | US | disclosed |
| EP-4429872-A1 | VAT POLYMERIZATION PROCESS | Polyfos 3D Ltd (IL) | 2024-09-18 | — | — | EP | disclosed |
| CN-117106128-A | Fluorine-containing acrylate polymer, preparation method thereof, fluorinated polymer photoresist material and application thereof | 吉林大学 | 2023-11-24 | — | — | CN | disclosed |
| WO-2023084517-A1 | VAT POLYMERIZATION PROCESS | POLYFOS 3D LTD (IL) | 2023-05-19 | — | — | WO | disclosed |
| CN-112760035-B | Photocuring composite flexible anti-reflection coating and preparation method and application thereof | 中国科学院宁波材料技术与工程研究所 | 2022-04-08 | — | — | CN | disclosed |
| CN-112760035-A | Photocuring composite flexible anti-reflection coating and preparation method and application thereof | 中国科学院宁波材料技术与工程研究所 | 2021-05-07 | — | — | CN | disclosed |
| CN-112313580-A | Chemically amplified positive resist composition for pattern profile improvement | 荣昌化学制品株式会社 | 2021-02-02 | — | — | CN | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-6010826-A | Resist composition | NIPPON ZEON CO., LTD. (JP) | 2000-01-04 | — | — | US | disclosed |
| EP-0786701-A1 | RESIST COMPOSITION | NIPPON ZEON CO., LTD. (JP) | 1997-07-30 | — | — | EP | disclosed |