⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3890552 | 0.77 | — | — | |
| SCHEMBL138265 | 0.77 | — | — | |
| SCHEMBL23700988 | 0.74 | — | — | |
| SCHEMBL3404313 | 0.74 | — | — | |
| SCHEMBL17763391 | 0.74 | — | — | |
| SCHEMBL28236606 | 0.74 | — | — | |
| SCHEMBL4535751 | 0.72 | — | — | |
| SCHEMBL19941575 | 0.72 | — | — | |
| SCHEMBL29091444 | 0.72 | — | — | |
| SCHEMBL21082147 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-8167601-A | — | — | None | — | — | JP | disclosed |
| US-12187618-B2 | Silica particle dispersion liquid and production method thereof | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2025-01-07 | — | — | US | disclosed |
| CN-112175565-B | Moisture-curable resin composition and cured product | 三键有限公司 | 2024-07-02 | — | — | CN | disclosed |
| US-11542167-B2 | Silica particle dispersion liquid and production method thereof | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-11312634-B2 | Production method for dispersion liquid of silica particle | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2022-04-26 | — | — | US | disclosed |
| US-11254580-B2 | Silica particle liquid dispersion and production method therefor | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2022-02-22 | — | — | US | disclosed |
| CN-109850973-B | Seawater desalination and sewage treatment device and preparation method thereof | 南京大学 | 2021-11-16 | — | — | CN | disclosed |
| CN-113479958-A | Photothermal conversion seawater desalination device, manufacturing method and seawater desalination method | 哈尔滨工业大学（深圳） | 2021-10-08 | — | — | CN | disclosed |
| WO-2021122431-A1 | POLYURETHANE FOAMS BASED ON POLYETHER CARBONATE POLYOLS | COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) | 2021-06-24 | — | — | WO | disclosed |
| EP-3838964-A1 | POLYURETHANE FOAMS BASED ON POLYETHER CARBONATE POLYOLS | Covestro Deutschland AG (DE) | 2021-06-23 | — | — | EP | disclosed |
| US-6083314-A | Coating liquid for forming porous silica coating, coated substrate and short fiber silica | CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. (JP) | 2000-07-04 | — | — | US | disclosed |
| US-6057250-A | Low temperature reflow dielectric-fluorinated BPSG | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-05-02 | — | — | US | disclosed |
| EP-0992556-A1 | COATING LIQUID FOR FORMING SILICA-BASED FILM HAVING LOW DIELECTRIC CONSTANT AND SUBSTRATE HAVING FILM OF LOW DIELECTRIC CONSTANT COATED THEREON | Catalysts & Chemicals Industries Co., Ltd. (JP) | 2000-04-12 | — | — | EP | disclosed |
| EP-0932188-A2 | Glass formation on a semi-conductor wafer | International Business Machines Corporation (US) | 1999-07-28 | — | — | EP | disclosed |
| EP-0890623-A1 | COATING FLUID FOR LOW-PERMITTIVITY SILICA COATING AND SUBSTRATE PROVIDED WITH LOW-PERMITTIVITY COATING | Catalysts & Chemicals Industries Co., Ltd. (JP) | 1999-01-13 | — | — | EP | disclosed |
| US-5700736-A | Method for making semiconductor device | SONY CORPORATION (JP) | 1997-12-23 | — | — | US | disclosed |
| EP-0736538-A2 | Process for the preparation of fluorosilanes | PCR, Inc. (US) | 1996-10-09 | — | — | EP | disclosed |
| JP-H08167601-A | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | SONY CORP | 1996-06-25 | — | — | JP | disclosed |
| US-5466850-A | Process for the preparation of fluorosilanes | PCR, INC. (US) | 1995-11-14 | — | — | US | disclosed |
| US-5399529-A | Process for producing semiconductor devices | NEC CORPORATION (JP) | 1995-03-21 | — | — | US | disclosed |