⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28236606 | 0.96 | — | — | |
| SCHEMBL3890552 | 0.77 | — | — | |
| SCHEMBL704746 | 0.77 | — | — | |
| SCHEMBL31211141 | 0.77 | CES1 (0.38) | — | |
| SCHEMBL23700988 | 0.74 | — | — | |
| SCHEMBL3404313 | 0.74 | — | — | |
| SCHEMBL17763391 | 0.74 | — | — | |
| SCHEMBL646707 | 0.72 | — | — | |
| SCHEMBL19941575 | 0.72 | — | — | |
| SCHEMBL4535751 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1757 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4722411-A1 | A SEMICONDUCTOR MANUFACTURING APPARATUS AND A METHOD FOR MANUFACTURING OF A SEMICONDUCTOR | ASM IP Holding B.V. (NL) | 2026-04-08 | — | — | EP | claimed |
| US-20260085413-A1 | SEMICONDUCTOR MANUFACTURING APPARATUS AND A METHOD FOR MANUFACTURING OF A SEMICONDUCTOR | ASM IP HOLDING BV (NL) | 2026-03-26 | — | — | US | claimed |
| CN-119121448-B | Cut-resistant ultra-high molecular weight polyethylene fiber and preparation method thereof | 南通恒尚新材料科技有限公司 | 2025-05-09 | — | — | CN | claimed |
| CN-119931308-A | Organic-inorganic composite pipeline heat insulation material and preparation method and application thereof | 江苏苏博特新材料股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119797883-A | Nitrogen/fluorinated modified fumed silica composite powder and preparation method and application thereof | 东华大学 | 2025-04-11 | — | — | CN | claimed |
| CN-119707282-A | High-boron silicon optical lens glass and preparation process thereof | 常州市永佳玻璃制品有限公司 | 2025-03-28 | — | — | CN | claimed |
| CN-119663234-A | Semiconductor manufacturing apparatus and process | ASM IP私人控股有限公司 | 2025-03-21 | — | — | CN | claimed |
| US-20250092520-A1 | SEMICONDUCTOR MANUFACTURING APPARATUS AND PROCESS | ASM IP HOLDING B.V. (NL) | 2025-03-20 | — | — | US | claimed |
| EP-2262576-B1 | COMPOSITE MATERIALS CONTAINING NANOPARTICLES AND THEIR USE IN CHROMATOGRAPHY | WATERS TECHNOLOGIES CORP (US) | 2025-03-12 | — | — | EP | claimed |
| CN-119593195-A | Hydrophilic material, hydrophobic material, preparation method of hydrophilic material and hydrophobic material, and gas-liquid separation filter device with hydrophilic material and hydrophobic material | 中科瑞丽分离科技无锡有限公司 | 2025-03-11 | — | — | CN | claimed |
| US-5497262-A | Support posts for micro-mechanical devices | TEXAS INSTRUMENTS INCORPORATED (US) | 1996-03-05 | — | — | US | claimed |
| EP-0694801-A2 | Improvements in and relating to micro-mechanical devices | TEXAS INSTRUMENTS INCORPORATED (US) | 1996-01-31 | — | — | EP | claimed |
| US-5466850-A | Process for the preparation of fluorosilanes | PCR, INC. (US) | 1995-11-14 | — | — | US | claimed |
| US-5462899-A | Chemical vapor deposition method for forming SiO2 | NEC CORPORATION (JP) | 1995-10-31 | — | — | US | claimed |
| US-5405805-A | Method for forming interconnect structure, insulating films and surface protective films of semiconductor device | NEC CORPORATION (JP) | 1995-04-11 | — | — | US | claimed |
| US-5334552-A | Forming wiring layer over dielectric film on substrate surface covering with silicon dioxide film, then forming fluorine-containing silicon dioxide and flattening films, dry etching of flattening film | NEC CORPORATION (JP) | 1994-08-02 | — | — | US | claimed |
| US-5288518-A | Chemical vapor deposition method for forming fluorine containing silicon oxide film | NEC CORPROATION (JP) | 1994-02-22 | — | — | US | claimed |
| US-5215787-A | Using a vapor containing an alkoxyfluorosilane; temperature | NEC CORPORATION (JP) | 1993-06-01 | — | — | US | claimed |
| EP-0517548-A2 | Chemical vapor deposition method for forming silicon oxide film | NEC CORPORATION (JP) | 1992-12-09 | — | — | EP | claimed |
| EP-0496543-A2 | Method of forming silicon oxide film containing fluorine | NEC CORPORATION (JP) | 1992-07-29 | — | — | EP | claimed |