⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17763391 | 0.79 | — | — | |
| SCHEMBL23700988 | 0.79 | — | — | |
| SCHEMBL138265 | 0.74 | — | — | |
| SCHEMBL704746 | 0.74 | — | — | |
| SCHEMBL3890552 | 0.74 | — | — | |
| SCHEMBL25327708 | 0.73 | CA1 (0.32) | — | |
| SCHEMBL3482339 | 0.71 | — | — | |
| SCHEMBL28236606 | 0.71 | — | — | |
| SCHEMBL27813 | 0.69 | — | — | |
| SCHEMBL9123116 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118613545-A | Mixed composition, film obtained by curing the mixed composition, and glass having the film | 住友化学株式会社 | 2024-09-06 | — | — | CN | disclosed |
| CN-108139671-B | Photosensitive resin composition and cured film prepared therefrom | 罗门哈斯电子材料韩国有限公司 | 2022-02-11 | — | — | CN | disclosed |
| CN-107428891-B | Curable composition | 施敏打硬株式会社 | 2021-04-20 | — | — | CN | disclosed |
| US-10890846-B2 | Photosensitive resin composition and cured film prepared therefrom | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD (KR) | 2021-01-12 | — | — | US | disclosed |
| EP-3081612-B1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO LTD (JP) | 2018-11-14 | — | — | EP | disclosed |
| US-20180314153-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-11-01 | — | — | US | disclosed |
| CN-105829485-B | Photocurable composition with adhesiveness | 思美定株式会社 | 2018-10-12 | — | — | CN | disclosed |
| US-9718999-B2 | Photocurable composition having adhesive properties | CEMEDINE CO., LTD (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160312089-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO., LTD. (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-3081612-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | Cemedine Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| CN-101326255-B | Continuous process for producing silicone pressure sensitive adhesives | DOW CORNING | 2013-09-25 | — | — | CN | disclosed |
| CN-101223257-B | Pressure sensitive adhesives and methods for their preparation | DOW CORNING INC | 2011-06-29 | — | — | CN | disclosed |
| US-20100324240-A1 | CATALYST FOR THE POLYMERIZATION OF OLEFINS | BASELL POLYOLEFINE ITALIA S.R.L (IT) | 2010-12-23 | — | — | US | disclosed |
| EP-2252637-A1 | CATALYST FOR THE POLYMERIZATION OF OLEFINS | Basell Poliolefine Italia S.R.L. (IT) | 2010-11-24 | — | — | EP | disclosed |
| WO-2009112399-A1 | CATALYST FOR THE POLYMERIZATION OF OLEFINS | BASELL POLIOLEFINE ITALIA S.R.L. (IT) | 2009-09-17 | — | — | WO | disclosed |
| CN-101326255-A | Continuous process for producing silicone pressure sensitive adhesives | DOW CORNING (US) | 2008-12-17 | — | — | CN | disclosed |
| CN-101223257-A | Pressure sensitive adhesives and methods for their preparation | DOW CORNING (US) | 2008-07-16 | — | — | CN | disclosed |
| EP-0768352-A1 | MATERIAL FOR FORMING SILICA-BASE COATED INSULATION FILM, PROCESS FOR PRODUCING THE MATERIAL, SILICA-BASE INSULATION FILM, SEMICONDUCTOR DEVICE, AND PROCESS FOR PRODUCING THE DEVICE | HITACHI CHEMICAL CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0285092-B1 | PROCESS TO STRENGTHEN THE ADHERENCE OF POLYMER MATERIALS | Wacker-Chemie GmbH (DE) | 1990-11-14 | — | — | EP | disclosed |
| US-4874638-A | PRECOATING AN ALKALINE CARBONATE SURFACE WITH AN APROTIC SOLVENT SOLUTION CONTAINING AN ORGANO SILICON FLUORIDE; DESOLVENTIZING | WACKER-CHEMIE GMBH (DE) | 1989-10-17 | — | — | US | disclosed |