⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4179254 | 0.99 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL4165039 | 0.89 | — | — | |
| SCHEMBL5353043 | 0.86 | CA2 (0.31) | — | |
| SCHEMBL4165959 | 0.86 | — | — | |
| SCHEMBL6817556 | 0.86 | — | — | |
| SCHEMBL5367225 | 0.85 | KMT2A (0.32) | — | |
| SCHEMBL7708623 | 0.85 | — | — | |
| SCHEMBL7048765 | 0.82 | — | — | |
| SCHEMBL4165403 | 0.82 | KMT2A (0.33) | — | |
| SCHEMBL7049130 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |