⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9807131 | 0.81 | TSHR (0.52) | — | |
| SCHEMBL12200013 | 0.79 | TSHR (0.56) | — | |
| SCHEMBL8891489 | 0.79 | TSHR (0.56) | — | |
| SCHEMBL7693766 | 0.79 | TSHR (0.56) | — | |
| SCHEMBL1472003 | 0.79 | — | — | |
| SCHEMBL514984 | 0.78 | TSHR (0.50) | — | |
| SCHEMBL1761096 | 0.77 | TSHR (0.48) | — | |
| SCHEMBL3683866 | 0.76 | TSHR (0.52) | — | |
| SCHEMBL363847 | 0.76 | TSHR (0.52) | — | |
| SCHEMBL451042 | 0.76 | TSHR (0.52) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250162296-A1 | MULTILAYER FILM | TORAY INDUSTRIES, INC. (JP) | 2025-05-22 | — | — | US | disclosed |
| EP-4541587-A1 | MULTILAYER FILM | Toray Industries, Inc. (JP) | 2025-04-23 | — | — | EP | disclosed |
| CN-119768741-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119604817-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-03-11 | — | — | CN | disclosed |
| CN-119212870-A | Laminated film | 东丽株式会社 | 2024-12-27 | — | — | CN | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-110537146-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| WO-2023243692-A1 | MULTILAYER FILM | 東レ株式会社 | 2023-12-21 | — | — | WO | disclosed |
| CN-110573963-B | Photosensitive resin composition | 日产化学株式会社 | 2023-10-24 | — | — | CN | disclosed |
| US-9878523-B2 | Laminated film | TORAY INDUSTRIES, INC. (JP) | 2018-01-30 | — | — | US | disclosed |
| US-4994133-A | Impregnating substrate with unsaturated polyester; curing | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1991-02-19 | — | — | US | disclosed |
| US-4698367-A | FOOD PACKAGES | SEKISUI KASEIHIN KOGYO KABUSHIKI KAISHA (JP) | 1987-10-06 | — | — | US | disclosed |
| US-4632961-A | DISPERSING AMPHOTERIC RESIN | NIPPON PAINT CO., LTD. (JP) | 1986-12-30 | — | — | US | disclosed |
| US-4571279-A | CELLULOSIC SUBSTRATE CROSSLINKED WITH UNSATURATED POLYESTER BY N-METHYLOL COMPOUND | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1986-02-18 | — | — | US | disclosed |
| EP-0031852-B1 | PROCESS AND APPARATUS FOR CONTINUOUS PRODUCTION OF LAMINATES | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1985-11-21 | — | — | EP | disclosed |
| US-4451317-A | Continuous process for producing reinforced resin laminates | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1984-05-29 | — | — | US | disclosed |
| US-4372800-A | Continuous process for producing reinforced resin laminates | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1983-02-08 | — | — | US | disclosed |
| EP-0031852-A1 | PROCESS AND APPARATUS FOR CONTINUOUS PRODUCTION OF LAMINATES | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1981-07-15 | — | — | EP | disclosed |
| US-4139672-A | UNDERVOATING, ELECTROCOATING, INTERMEDIATE COAT CONTAINING METAL FARBOXYLIC ACID | MITSUI TOATSU CHEMICALS, INC. (JP) | 1979-02-13 | — | — | US | disclosed |
| US-4048136-A | ACRYLIC RESINS, ENCAPSULATED METAL POWDERS, ALUMINUM | MITSUI TOATSU KAGAKU KABUSHIKI KAISHA (MITSUI TOATSU CHEM., INC.) (JA) | 1977-09-13 | — | — | US | disclosed |