⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3157385 | 0.71 | — | — | |
| SCHEMBL707269 | 0.59 | — | — | |
| SCHEMBL707573 | 0.56 | — | — | |
| SCHEMBL705479 | 0.56 | — | — | |
| SCHEMBL42198 | 0.53 | — | — | |
| SCHEMBL10388078 | 0.47 | — | — | |
| Fluoride SCHEMBL7699537 | 0.47 | — | — | |
| Helium SCHEMBL3859739 | 0.47 | — | — | |
| Hydrochloric Acid SCHEMBL10797371 | 0.47 | — | — | |
| SCHEMBL20768009 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250289834-A1 | SILICON COMPOUND AND METHOD OF PRODUCING SILICON-CONTAINING THIN FILM USING THE SAME | DNF CO., LTD. (KR) | 2025-09-18 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-6569404-B1 | Aqueous colloidal suspension, dispersed phase is gas microbubbles of perfluoropropane, perfluorobutane, perfluoropentane, perfluorohexane or sulfur hexafluoride; fluorinated amphiphile for stabilizing microbubbles | AMERSHAM HEALTH A/S (NO) | 2003-05-27 | — | — | US | disclosed |
| US-6245319-B1 | Colloidal dispersions of perfluoropentane | SONUS PHARMACEUTICALS, INC. | 2001-06-12 | — | — | US | disclosed |