SCHEMBL705156

SCHEMBL705156

CCC[SiH](OC(C)=O)OC(C)=O

nearest known ligand 0.38

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.38
LMNA P02545 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TSHR P16473 2/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704158 0.85 ALDH1A1 (0.44) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL11492778 0.83 ALDH1A1 (0.43) ALDH1A1HSD17B10TSHRTDP1
SCHEMBL3341111 0.83 TSHR (0.34) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL18496519 0.81 ALDH1A1 (0.41) ALDH1A1HSD17B10TSHRTDP1
SCHEMBL18496521 0.81 ALDH1A1 (0.41) ALDH1A1HSD17B10TSHRTDP1
SCHEMBL13089624 0.81 ALDH1A1 (0.33) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL4340186 0.79 ALDH1A1 (0.38) ALDH1A1LMNAHSD17B10TSHRTDP1
SCHEMBL708748 0.78 ALDH1A1 (0.41) ALDH1A1LMNAHSD17B10TSHRTDP1
SCHEMBL5385431 0.77 PAOX (0.31) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL5390200 0.77 ALDH1A1 (0.31) ALDH1A1LMNAHSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101639628-B Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element JSR CORP JP 2013-04-03 CN disclosed
CN-101646718-B Curable resin composition, protective film, and method for forming protective film JSR CORP JP 2013-04-03 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
CN-101646718-A The formation method of curable resin composition, protective membrane and protective membrane JSR CORP JP 2010-02-10 CN disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
CN-101639628-A Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element JSR CORP JP 2010-02-03 CN disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
EP-1098926-B1 CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME BAYER MATERIALSCIENCE AG (DE) 2004-03-03 EP disclosed
EP-1098926-A1 CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME Bayer Aktiengesellschaft (DE) 2001-05-16 EP disclosed
WO-2000002954-A1 CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME BAYER AKTIENGESELLSCHAFT (DE) 2000-01-20 WO disclosed