SCHEMBL704158

SCHEMBL704158

CCCC[SiH](OC(C)=O)OC(C)=O

nearest known ligand 0.44

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.44
CES1 P23141 6/20 0.36
CES2 O00748 7/20 0.35
LMNA P02545 1/20 0.35
HSD17B10 Q99714 1/20 0.35
FAAH O00519 1/20 0.33
TSHR P16473 2/20 0.32
ATM Q13315 1/20 0.32
AKR1B1 P15121 1/20 0.32
TP53 P04637 1/20 0.32
NAAA Q02083 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11492778 0.93 ALDH1A1 (0.43) ALDH1A1CES1CES2HSD17B10FAAH
SCHEMBL18496519 0.91 ALDH1A1 (0.41) ALDH1A1CES1CES2HSD17B10FAAH
SCHEMBL18496521 0.91 ALDH1A1 (0.41) ALDH1A1CES1CES2HSD17B10FAAH
SCHEMBL13089624 0.87 ALDH1A1 (0.33) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL705156 0.85 ALDH1A1 (0.38) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL204697 0.81 ALDH1A1 (0.44) ALDH1A1CES1CES2LMNAHSD17B10
SCHEMBL3894115 0.80 CES2 (0.40) ALDH1A1CES2TSHR
SCHEMBL8399355 0.79
SCHEMBL7633546 0.77 PAOX (0.41) ALDH1A1LMNATSHR
SCHEMBL7980170 0.77 FOLH1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12492272-B2 Modified vinyl alcohol polymer, aqueous solution, and method for producing modified vinyl alcohol polymer KURARAY CO., LTD. (JP) 2025-12-09 US disclosed
CN-116635503-B Modified vinyl alcohol polymer, method for producing modified vinyl alcohol polymer, particles, aqueous solution, coating liquid, coating material, molded article, release paper, dispersant, method for producing vinyl polymer, and mixture 株式会社可乐丽 2024-12-17 CN disclosed
CN-114450329-B Film for producing optical film, method for producing optical film, and optical film 株式会社可乐丽 2024-11-01 CN disclosed
US-20240309141-A1 MODIFIED VINYL ALCOHOL POLYMER, MODIFIED VINYL ALCOHOL POLYMER PRODUCTION METHOD, PARTICLES, AQUEOUS SOLUTION, COATING LIQUID, COATED ARTICLE, MOLDED PRODUCT, RELEASE PAPER, DISPERSANT, VINYL POLYMER PRODUCTION METHOD, AND MIXTURE KURARAY CO., LTD. (JP) 2024-09-19 US disclosed
CN-116635503-A Modified vinyl alcohol polymer, method for producing modified vinyl alcohol polymer, particles, aqueous solution, coating liquid, coating material, molded article, release paper, dispersant, method for producing vinyl polymer, and mixture 株式会社可乐丽 2023-08-22 CN disclosed
US-20230242688-A1 MODIFIED VINYL ALCOHOL POLYMER, AQUEOUS SOLUTION, AND METHOD FOR PRODUCING MODIFIED VINYL ALCOHOL POLYMER KURARAY CO., LTD. (JP) 2023-08-03 US disclosed
CN-116457709-A Film for producing optical film, method for producing optical film, and optical film 株式会社可乐丽 2023-07-18 CN disclosed
CN-116438230-A Film for producing optical film and method for producing optical film 株式会社可乐丽 2023-07-14 CN disclosed
CN-115996961-A Modified vinyl alcohol polymer, aqueous solution, and method for producing modified vinyl alcohol polymer 株式会社可乐丽 2023-04-21 CN disclosed
WO-2022138784-A1 MODIFIED VINYL ALCOHOL-BASED POLYMER, METHOD FOR PRODUCING MODIFIED VINYL ALCOHOL-BASED POLYMER, PARTICLES, AQUEOUS SOLUTION, COATING LIQUID, COATED ARTICLE, MOLDED BODY, RELEASE PAPER, DISPERSANT, METHOD FOR PRODUCING VINYL-BASED POLYMER, AND MIXTURE 株式会社クラレ 2022-06-30 WO disclosed
WO-2022097336-A1 FILM FOR PRODUCING OPTICAL FILM, METHOD FOR PRODUCING OPTICAL FILM, AND OPTICAL FILM 株式会社クラレ 2022-05-12 WO disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
CN-100535054-C Silica film forming material, silica film and preparation method thereof FUJITSU LTD (JP) 2009-09-02 CN disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
CN-1891757-A Silica film forming material, silica film and method of manufacturing the same FUJITSU LTD (JP) 2007-01-10 CN disclosed
EP-1098926-B1 CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME BAYER MATERIALSCIENCE AG (DE) 2004-03-03 EP disclosed
US-6204339-B1 ELASTOMER WITH AN INTRINSIC OR EXTRINSIC CROSSLINKER, A CURE CATALYST CONTAINING METALLIC OR ORGANOMETALLIC CATALYST, A BLOCKED MERCAPTOSILANE, A DEBLOCKING AGENT AND A SUBSTRATE; USED AS ADHESIVE, SEALANT OR COATING ON A SUBSTRATE CROMPTON CORPORATION 2001-03-20 US disclosed
US-5645901-A RESIN SUBSTRATE, CURED COATING LAMINATED TO SUBSTRATE, SILOXANE CURED COATING CONTAINING FINE SILICA PARTICLES, AND INDIUM TIN OXIDE FILM SHARP KABUSHIKI KAISHA (JP) 1997-07-08 US disclosed