SCHEMBL705161

SCHEMBL705161

CC(C)[Si](Br)(C(C)C)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL705110 0.74
SCHEMBL7023995 0.70
SCHEMBL15526506 0.70
SCHEMBL8423462 0.70
SCHEMBL708600 0.70
SCHEMBL31163019 0.70
SCHEMBL11240395 0.67 ALDH1A1 (0.40)
SCHEMBL9357118 0.67
SCHEMBL8423490 0.67 ALDH1A1 (0.31)
SCHEMBL4352 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 196 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250060673-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RES CORP (US) 2025-02-20 US claimed
WO-2023115023-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RESEARCH CORPORATION (US) 2023-06-22 WO claimed
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US claimed
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN claimed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US claimed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN claimed
EP-1688423-B1 Silylation of hydroxyl group-containing compounds SHINETSU CHEMICAL CO (JP) 2010-09-08 EP claimed
EP-4737444-A1 PROCESSES AND INTERMEDIATES FOR PREPARING MCL1 INHIBITORS Gilead Sciences, Inc. (US) 2026-05-06 EP disclosed
EP-4458792-B1 1-HALO-2,6,14-TRIMETHYLOCTADECANE COMPOUND AND PROCESS FOR PREPARING 5,13,17-TRIMETHYLALKANE COMPOUND THEREFROM SHINETSU CHEMICAL CO (JP) 2026-04-29 EP disclosed
US-12583948-B2 Photohardenable compositions, methods, and a stabilizer QUADRATIC 3D, INC. (US) 2026-03-24 US disclosed
EP-4286356-B1 (4Z,6E)-4,6-UNDECADIENYL TRIMETHYLACETATE AND PROCESS FOR PREPARING (5Z,7E)-5,7-DODECADIENE COMPOUND THEREFROM SHINETSU CHEMICAL CO (JP) 2026-01-21 EP disclosed
US-20250376758-A1 SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL ASM IP HOLDING BV (NL) 2025-12-11 US disclosed
US-12410146-B2 Processes and intermediates for preparing MCL1 inhibitors GILEAD SCIENCES, INC. (US) 2025-09-09 US disclosed
US-20030139619-A1 Silylation of hydroxyl groups SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-07-24 US disclosed
US-20030130511-A1 Method of converting functional group through halogen-metal exchange reaction MSD K.K. (JP) 2003-07-10 US disclosed
US-20030055297-A1 An alkyl, cycloalkyl, arylalkyl dihydroxy compound useful as intermediates; a cost-effective preparation ABBOTT LABORATORIES 2003-03-20 US disclosed
EP-1253152-A1 METHOD OF CONVERTING FUNCTIONAL GROUP THROUGH HALOGEN-METAL EXCHANGE REACTION BANYU PHARMACEUTICAL CO., LTD. (JP) 2002-10-30 EP disclosed
WO-2002081441-A1 PROCESS FOR THE PREPARATION OF SUBSTITUTED PYRROLIDINE NEURAMINIDASE INHIBITORS ABBOTT LABORATORIES (US) 2002-10-17 WO disclosed
US-6414160-B1 REACTING 5-ALKOXY-2(3H)OXAZOLONE COMPOUND WITH ALDEHYDE COMPOUND IN PRESENCE OF LEWIS ACID CATALYST UBE INDUSTRIES, LTD. (JP) 2002-07-02 US disclosed
EP-1000937-A1 PROCESS FOR PRODUCING 4-ALKOXYCARBONYL-2-OXAZOLIDINONE COMPOUNDS UBE INDUSTRIES LIMITED (JP) 2000-05-17 EP disclosed