⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705110 | 0.74 | — | — | |
| SCHEMBL15526506 | 0.70 | — | — | |
| SCHEMBL7023995 | 0.70 | — | — | |
| SCHEMBL705161 | 0.70 | — | — | |
| SCHEMBL31163019 | 0.70 | — | — | |
| SCHEMBL8423462 | 0.70 | — | — | |
| SCHEMBL11240395 | 0.67 | ALDH1A1 (0.40) | — | |
| SCHEMBL8423490 | 0.67 | ALDH1A1 (0.31) | — | |
| SCHEMBL9357118 | 0.67 | — | — | |
| SCHEMBL4352 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | claimed |
| WO-2024211411-A1 | PERFORMING ATOMIC LAYER ETCHING USING A SILANE-BASED CHEMISTRY | LAM RESEARCH CORPORATION (US) | 2024-10-10 | — | — | WO | claimed |
| WO-2023115023-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | claimed |
| US-20250376758-A1 | SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL | ASM IP HOLDING BV (NL) | 2025-12-11 | — | — | US | disclosed |
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | disclosed |
| WO-2024211411-A1 | PERFORMING ATOMIC LAYER ETCHING USING A SILANE-BASED CHEMISTRY | LAM RESEARCH CORPORATION (US) | 2024-10-10 | — | — | WO | disclosed |
| CN-108375878-B | Polymerizable composition, method for producing cured film, and cured film | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| US-11718717-B2 | Resin composition, method for producing resin composition, film formation method, and cured product | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| WO-2023115023-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| CN-114507329-A | PH response controllable degradable polyurethane and preparation method thereof | 中国人民大学 | 2022-05-17 | — | — | CN | disclosed |
| CN-108884228-B | Process for producing organic polysilane | 日本曹达株式会社 | 2021-06-29 | — | — | CN | disclosed |
| EP-1705206-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1701963-A1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2006-09-20 | — | — | EP | disclosed |
| WO-2005066191-A1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2005-07-21 | — | — | WO | disclosed |
| US-20050143254-A1 | Haloaluminoxane compositions, their preparation, and their use in catalysis | W. R. GRACE & CO.-CONN. | 2005-06-30 | — | — | US | disclosed |
| US-20050118742-A1 | Method for reducing the adhesive properties of MEMS and anti-adhesion-coated device | ROBERT BOSCH GMBH (DE) | 2005-06-02 | — | — | US | disclosed |
| EP-1110965-A2 | Process for preparing 1,3-dihalo-1,1,3,3-tetra(organyl)disiloxanes | Wacker-Chemie GmbH (DE) | 2001-06-27 | — | — | EP | disclosed |
| US-5997637-A | Method of producing a semiconducting material | NIPPON OIL CO., LTD. (JP) | 1999-12-07 | — | — | US | disclosed |
| EP-0632086-B1 | A method of producing a semiconducting material | NIPPON OIL CO LTD (JP) | 1999-10-06 | — | — | EP | disclosed |
| EP-0632086-A2 | A method of producing a semiconducting material | NIPPON OIL CO., LTD. (JP) | 1995-01-04 | — | — | EP | disclosed |