SCHEMBL7052264

SCHEMBL7052264

O=C(Nc1ccc(S(=O)(=O)c2ccc(NC(=O)c3ccc(C(=O)O)c(C(=O)O)c3)cc2)cc1)c1ccc(C(=O)O)c(C(=O)O)c1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.63
MEN1 O00255 3/20 0.63
HPGD P15428 1/20 0.63
PRMT1 Q99873 4/20 0.62
KDM4E B2RXH2 2/20 0.57
LMNA P02545 1/20 0.57
MAPT P10636 1/20 0.57
MAPK1 P28482 1/20 0.57
APEX1 P27695 2/20 0.54
NAMPT P43490 2/20 0.54
POLB P06746 1/20 0.54
CTDSP1 Q9GZU7 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
SETD7 Q8WTS6 1/20 0.53
TDP1 Q9NUW8 2/20 0.52
CA1 P00915 2/20 0.51
CA2 P00918 2/20 0.51
RXFP1 Q9HBX9 1/20 0.48
GPR27 Q9NS67 1/20 0.48
CA12 O43570 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3757836 0.85 KMT2A (0.69) KMT2AMEN1HPGDKDM4EMAPK1
SCHEMBL25452049 0.84 PTPN1 (0.59) KMT2AMEN1POLBTDP1HPSE
SCHEMBL6426034 0.84 KMT2A (0.58) KMT2AMEN1HPGDKDM4EMAPT
SCHEMBL13863665 0.83 KMT2A (0.48) KMT2AMEN1HPGDPRMT1KDM4E
SCHEMBL14864556 0.79 ALDH1A1 (0.60) KMT2AMEN1HPGDPRMT1KDM4E
SCHEMBL7046645 0.79 POLB (0.66) KDM4EAPEX1POLBCTDSP1L3MBTL1
SCHEMBL19457338 0.78 ALDH1A1 (0.62) KMT2AMEN1HPGDPRMT1KDM4E
SCHEMBL12189487 0.78 ALDH1A1 (0.69) KMT2AMEN1HPGDPRMT1KDM4E
SCHEMBL7052262 0.78 APEX1 (0.51) KMT2AMEN1HPGDPRMT1KDM4E
SCHEMBL14426507 0.77 ALDH1A1 (0.62) KMT2AMEN1HPGDKDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0957400-B1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN THEREFROM, ELECTRONIC DEVICES PRODUCED BY USING THE SAME, AND METHOD FOR PRODUCTION THEREOF HITACHI CHEMICAL CO LTD (JP) 2003-04-16 EP disclosed
US-6291619-B1 HEAT RESISTANCE HITACHI CHEMICAL CO., LTD (JP) 2001-09-18 US disclosed
EP-0957400-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN THEREFROM, ELECTRONIC DEVICES PRODUCED BY USING THE SAME, AND METHOD FOR PRODUCTION THEREOF HITACHI CHEMICAL CO., LTD. (JP) 1999-11-17 EP disclosed