SCHEMBL705250

SCHEMBL705250

C[Si](Cl)(Cl)CCC[Si](C)(Cl)Cl

nearest known ligand 0.39

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL523832 0.92 ALDH1A1 (0.39) ALDH1A1
SCHEMBL9079536 0.89 ALDH1A1 (0.31) ALDH1A1
SCHEMBL4262638 0.88 ALDH1A1 (0.36) ALDH1A1
SCHEMBL8757251 0.88 ALDH1A1 (0.36) ALDH1A1
SCHEMBL1031064 0.88 ALDH1A1 (0.36) ALDH1A1
SCHEMBL523587 0.82 ALDH1A1 (0.46) ALDH1A1
SCHEMBL446925 0.82
SCHEMBL523016 0.82
SCHEMBL30711792 0.80 LMNA (0.38)
SCHEMBL5027533 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2963066-B1 MODIFIED CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING SAME, POLYMER COMPOSITION, CROSSLINKED POLYMER, AND TIRE JSR CORP (JP) 2017-12-27 EP disclosed
US-20160009903-A1 MODIFIED CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING SAME, POLYMER COMPOSITION, CROSSLINKED POLYMER, AND TIRE JSR CORPORATION (JP) 2016-01-14 US disclosed
EP-2963066-A1 MODIFIED CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING SAME, POLYMER COMPOSITION, CROSSLINKED POLYMER, AND TIRE JSR Corporation (JP) 2016-01-06 EP disclosed
CN-105026440-A Modified conjugated diene polymer, method for producing same, polymer composition, crosslinked polymer, and tire JSR CORP 2015-11-04 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20090206034-A1 MODIFIED SILICA GEL AND USE THEREOF DAISO CO., LTD. (JP) 2009-08-20 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-5527934-A HYDROSILATING BIS(DICHLOROSILYL)METHANES WITH ORGANOOLEFINS OR ORGANOSILYLOLEFINS IN THE PRESENCE OF CHLOROPLATINIC ACID CATALYST KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1996-06-18 US disclosed