SCHEMBL7053224

SCHEMBL7053224

Cc1cc(C(C)(c2ccccc2)c2ccc(C(=O)c3ccc(C(=O)O)c(C(=O)O)c3)c(C)c2)ccc1C(=O)c1ccc(C(=O)O)c(C(=O)O)c1

nearest known ligand 0.59

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 2/20 0.59
CDC25A P30304 1/20 0.59
HSD17B10 Q99714 1/20 0.59
ALDH1A1 P00352 3/20 0.54
TDP1 Q9NUW8 2/20 0.51
ESR1 P03372 2/20 0.50
ESR2 Q92731 2/20 0.50
KDM4E B2RXH2 1/20 0.50
POLB P06746 4/20 0.47
AKR1C3 P42330 2/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
LTC4S Q16873 2/20 0.42
RXRB P28702 1/20 0.41
NR1H4 Q96RI1 1/20 0.41
LMNA P02545 1/20 0.41
ATM Q13315 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7052040 0.85 CDC25A (0.57) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL3472775 0.85 ESR1 (0.53) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL8964225 0.82 CDC25B (0.77) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL8417273 0.77 CDC25A (0.62) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL2058645 0.76 CDC25B (1.00) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL3074652 0.76 CDC25B (1.00) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL11730705 0.75 TDP1 (0.64) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL11023998 0.75 TDP1 (0.59) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL8962208 0.75 CDC25B (0.70) CDC25BCDC25AHSD17B10ALDH1A1TDP1
SCHEMBL28024758 0.75 TDP1 (0.59) CDC25BCDC25AHSD17B10TDP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0957400-B1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN THEREFROM, ELECTRONIC DEVICES PRODUCED BY USING THE SAME, AND METHOD FOR PRODUCTION THEREOF HITACHI CHEMICAL CO LTD (JP) 2003-04-16 EP disclosed
US-6291619-B1 HEAT RESISTANCE HITACHI CHEMICAL CO., LTD (JP) 2001-09-18 US disclosed
EP-0957400-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN THEREFROM, ELECTRONIC DEVICES PRODUCED BY USING THE SAME, AND METHOD FOR PRODUCTION THEREOF HITACHI CHEMICAL CO., LTD. (JP) 1999-11-17 EP disclosed