SCHEMBL7052040

SCHEMBL7052040

Cc1cc(C(C)(C)c2ccc(C(=O)c3ccc(C(=O)O)c(C(=O)O)c3)c(C)c2)ccc1C(=O)c1ccc(C(=O)O)c(C(=O)O)c1

nearest known ligand 0.57

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CDC25A P30304 1/20 0.57
CDC25B P30305 1/20 0.57
HSD17B10 Q99714 1/20 0.57
TDP1 Q9NUW8 2/20 0.56
POLB P06746 3/20 0.51
L3MBTL1 Q9Y468 1/20 0.51
ALDH1A1 P00352 1/20 0.51
KDM4E B2RXH2 1/20 0.47
RXRB P28702 4/20 0.45
NR1H4 Q96RI1 1/20 0.45
AKR1C3 P42330 2/20 0.44
SRD5A2 P31213 1/20 0.42
ESR1 P03372 1/20 0.42
RXRA P19793 4/20 0.41
LTC4S Q16873 3/20 0.40
AKR1C2 P52895 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11023998 0.90 TDP1 (0.59) CDC25ACDC25BHSD17B10TDP1POLB
SCHEMBL11730705 0.87 TDP1 (0.64) CDC25ACDC25BHSD17B10TDP1POLB
SCHEMBL7053224 0.85 CDC25B (0.59) CDC25ACDC25BHSD17B10TDP1POLB
SCHEMBL2806543 0.84 RXRB (0.59) HSD17B10TDP1ALDH1A1KDM4ERXRB
SCHEMBL30295343 0.84 RXRB (0.59) HSD17B10TDP1ALDH1A1KDM4ERXRB
Bisphenol A SCHEMBL5923275 0.83 TDP1 (0.73) CDC25ACDC25BHSD17B10TDP1POLB
SCHEMBL29441322 0.82 TDP1 (0.56) CDC25ACDC25BHSD17B10TDP1POLB
SCHEMBL29361914 0.82 TDP1 (0.56) CDC25ACDC25BHSD17B10TDP1POLB
SCHEMBL105948 0.82 TDP1 (0.56) CDC25ACDC25BHSD17B10TDP1POLB
SCHEMBL9329773 0.81 TDP1 (0.66) CDC25ACDC25BHSD17B10TDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0957400-B1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN THEREFROM, ELECTRONIC DEVICES PRODUCED BY USING THE SAME, AND METHOD FOR PRODUCTION THEREOF HITACHI CHEMICAL CO LTD (JP) 2003-04-16 EP disclosed
US-6291619-B1 HEAT RESISTANCE HITACHI CHEMICAL CO., LTD (JP) 2001-09-18 US disclosed
EP-0957400-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN THEREFROM, ELECTRONIC DEVICES PRODUCED BY USING THE SAME, AND METHOD FOR PRODUCTION THEREOF HITACHI CHEMICAL CO., LTD. (JP) 1999-11-17 EP disclosed