SCHEMBL705505

SCHEMBL705505

Cl[SiH2]CC(c1ccccc1)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 6/20 0.46
HRH1 P35367 5/20 0.46
TAAR1 Q96RJ0 1/20 0.46
TDP1 Q9NUW8 1/20 0.44
TSHR P16473 1/20 0.43
CHRNB2 P17787 1/20 0.38
CHRNA4 P43681 1/20 0.38
DPP4 P27487 2/20 0.38
F2 P00734 1/20 0.38
MTOR P42345 1/20 0.37
RAB9A P51151 1/20 0.37
GRM7 Q14831 1/20 0.37
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5034187 0.78 CHRNA7 (0.38) HTR2AHRH1TDP1TSHRLMNA
SCHEMBL3481490 0.78 TAAR1 (0.52) HTR2AHRH1TAAR1TDP1TSHR
SCHEMBL705991 0.75 HRH1 (0.50) HTR2AHRH1TAAR1TDP1TSHR
SCHEMBL707096 0.74 HTR2A (0.46) HTR2AHRH1TAAR1TDP1TSHR
SCHEMBL706960 0.74 HTR2A (0.46) HTR2AHRH1TAAR1TDP1TSHR
SCHEMBL5143307 0.74 HTR2A (0.46) HTR2AHRH1TAAR1TDP1TSHR
SCHEMBL16648875 0.72 HRH1 (0.54) HTR2AHRH1TAAR1TDP1
SCHEMBL9728549 0.69 HTR2A (0.52) HTR2AHRH1TAAR1TDP1TSHR
SCHEMBL705544 0.69 HTR2A (0.41) HTR2AHRH1TAAR1TDP1TSHR
SCHEMBL14955209 0.69 HTR2A (0.41) HTR2AHRH1TAAR1TDP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8791221-B2 Addition-curable metallosiloxane compound DAICEL CORPORATION (JP) 2014-07-29 US disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
CN-103391947-A Stabilization of polymers containing hydrolyzable functional groups BRIDGESTONE CORP 2013-11-13 CN disclosed
EP-2650319-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND Daicel Corporation (JP) 2013-10-16 EP disclosed
US-20130267653-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND DAICEL CORPORATION (JP) 2013-10-10 US disclosed
CN-103249762-A Addition-curable metallosiloxane compound DAICEL CORP 2013-08-14 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
WO-1997016466-A1 POLYURETHANE (METH)ACRYLATES AND PROCESSES FOR PREPARING SAME UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1997-05-09 WO disclosed
US-5362519-A Polyesters particularly suitable for use in coating compositions which are sprayed with compressed fluids as vicosity reducing agents UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1994-11-08 US disclosed
US-5248752-A Improved moisture resistance, inks, coatings, sealants, adhesives UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-09-28 US disclosed
EP-0545110-A1 Polyesters for coating compositions which are sprayed with compressed fluids as viscosity reducing diluents UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-06-09 EP disclosed
EP-0545108-A1 Polyesters of branched aliphatic diols UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-06-09 EP disclosed
EP-0542220-A1 Polyurethanes and processes for preparing same UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-05-19 EP disclosed
EP-0542219-A2 Polyurethane (meth)acrylates and processes for preparing same UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-05-19 EP disclosed
EP-0542217-A2 Substituted 1,5-pentanediols and processes for the preparation thereof UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-05-19 EP disclosed
EP-0542218-A1 Conformal coating compositions UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-05-19 EP disclosed
CN-1072168-A 1 of replacement, 5-pentanediol and preparation method UNION CARBIDE CHEM PLASTIC (US) 1993-05-19 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130267653-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND B2M, MSI2, MNS1 HTR2A 3301/4885HRH1 1586/4885TAAR1 2705/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.