SCHEMBL7061883

SCHEMBL7061883

CCC(C)(C)c1ccc(OC(C)O[C]=O)c(C(C)(C)CC)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 6/20 0.48
SMN1; SMN2 Q16637 5/20 0.48
NPSR1 Q6W5P4 5/20 0.48
MEN1 O00255 4/20 0.48
KMT2A Q03164 4/20 0.48
ALDH1A1 P00352 1/20 0.48
MAPT P10636 5/20 0.42
HTT P42858 3/20 0.42
UBE2N P61088 2/20 0.42
GLA P06280 1/20 0.42
MITF O75030 1/20 0.42
RAB9A P51151 4/20 0.38
NPC1 O15118 3/20 0.38
RAD52 P43351 2/20 0.38
STAT3 P40763 1/20 0.38
RCE1 Q9Y256 1/20 0.38
APAF1 O14727 1/20 0.38
HSP90AA1 P07900 1/20 0.38
NOD2 Q9HC29 1/20 0.38
LMNA P02545 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5145846 0.83 MAPK1 (0.50) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL7227225 0.81 MAPK1 (0.53) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL8961897 0.81 MAPK1 (0.48) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL3276899 0.80 MAPK1 (0.55) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL5143774 0.80 MAPK1 (0.49) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL5489761 0.79 MAPK1 (0.50) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL7107870 0.79 MAPK1 (0.50) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL7786644 0.77 MAPK1 (0.47) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL28378701 0.77 MAPK1 (0.55) MAPK1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL9511637 0.76 MAPK1 (0.52) MAPK1SMN1; SMN2NPSR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030077542-A1 Photopolymerizable composition, recording material and image forming method FUJI PHOTO FILM CO., LTD. 2003-04-24 US disclosed