SCHEMBL706504

SCHEMBL706504

CCO[SiH2]C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7157777 0.80
Biphenyl SCHEMBL27660685 0.79 ALDH1A1 (0.38)
SCHEMBL704051 0.75
SCHEMBL27132206 0.75
SCHEMBL11513133 0.75
SCHEMBL704253 0.71 ADRB2 (0.38)
SCHEMBL8529308 0.71
SCHEMBL1052892 0.71
SCHEMBL7154754 0.71
SCHEMBL1532643 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220301862-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2022-09-22 US claimed
EP-4018013-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM Versum Materials US, LLC (US) 2022-06-29 EP claimed
WO-2021050659-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2021-03-18 WO claimed
CN-112239209-A Drug delivery through pore-modified mesoporous silica nanoparticles 奈力生医股份有限公司 2021-01-19 CN claimed
EP-3491030-A1 PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS Bridgestone Corporation (JP) 2019-06-05 EP claimed
CN-109715680-A The method for preparing high-cis -1,4- polydiene with the carbon monoxide-olefin polymeric based on lanthanide series 株式会社普利司通 2019-05-03 CN claimed
WO-2018022994-A1 PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS BRIDGESTONE CORPORATION (JP) 2018-02-01 WO claimed
JP-62022790-A None JP disclosed
CN-118620392-A Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-09-10 CN disclosed
CN-114660896-B Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound 信越化学工业株式会社 2024-06-11 CN disclosed
CN-110753732-B Flame retardant transparent coating for building panels 阿姆斯特郎世界工业公司 2022-06-21 CN disclosed
CN-113831676-A Antistatic resin composition, method for producing antistatic resin composition, and electronic component packaging material 旭化成株式会社 2021-12-24 CN disclosed
CN-113348207-A Block copolymer composition, molded article, method for producing molded article, and method for adjusting haze value of molded article 旭化成株式会社 2021-09-03 CN disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed
US-20090135356-A1 Anti-reflection film, polarizing plate, and liquid crystal display device FUJIFILM CORPORATION (JP) 2009-05-28 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
EP-0657473-B1 Alpha-olefin polymerization catalyst system and process for producing alpha-olefin catalyst SUMITOMO CHEMICAL CO (JP) 1999-04-21 EP disclosed
US-5608018-A CONTAINING TRIVALENT TITANIUM COMPOUND MADE BY REDUCING A TETRAVALENT HYDROCARBYLOXYTITANIUM COMPOUND MIXED WITH ORGANOSILOXY COMPOUND AND ESTER BY MEANS OF ORGANOMAGNESIUM COMPOUND, ESTER-TREATING AND ETHER-TICL4-TREATING PRODUCT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1997-03-04 US disclosed
EP-0657473-A2 Alpha-olefin polymerization catalyst system and process for producing alpha-olefin catalyst SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-06-14 EP disclosed
JP-S6222790-A PRODUCTION OF TERTIARY HYDROCARBONSILYL COMPOUND SHIN ETSU CHEM CO LTD 1987-01-30 JP disclosed