⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23189541 | 0.74 | — | — | |
| SCHEMBL1087681 | 0.74 | ALDH1A1 (0.44) | — | |
| SCHEMBL6562680 | 0.72 | — | — | |
| SCHEMBL203137 | 0.67 | — | — | |
| SCHEMBL18241826 | 0.67 | ALDH1A1 (0.44) | — | |
| SCHEMBL6384726 | 0.67 | ALDH1A1 (0.32) | — | |
| SCHEMBL29167459 | 0.65 | ALDH1A1 (0.30) | — | |
| SCHEMBL8734714 | 0.65 | — | — | |
| SCHEMBL8734710 | 0.65 | — | — | |
| SCHEMBL49924 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1606329-A1 | A PROCESS FOR THE PRODUCTION OF ACID GROUP CONTAINING POLYMER RESIN | SigmaKalon B.V. (NL) | 2005-12-21 | — | — | EP | claimed |
| WO-2004085502-A1 | A PROCESS FOR THE PRODUCTION OF ACID GROUP CONTAINING POLYMER RESIN | SIGMAKALON B.V. (NL) | 2004-10-07 | — | — | WO | claimed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-1606329-A1 | A PROCESS FOR THE PRODUCTION OF ACID GROUP CONTAINING POLYMER RESIN | SigmaKalon B.V. (NL) | 2005-12-21 | — | — | EP | disclosed |
| WO-2004085502-A1 | A PROCESS FOR THE PRODUCTION OF ACID GROUP CONTAINING POLYMER RESIN | SIGMAKALON B.V. (NL) | 2004-10-07 | — | — | WO | disclosed |
| WO-2004005302-A1 | PROCESS FOR THE PREPARATION OF ACYLOXYSILANES | SIGMA COATINGS B.V. (NL) | 2004-01-15 | — | — | WO | disclosed |
| EP-1378514-A1 | Process for the preparation of acyloxysilanes | SigmaKalon Group B.V. (NL) | 2004-01-07 | — | — | EP | disclosed |