Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | PTP4A3 | O75365 | 2/20 | 0.32 |
| ▸ | PTP4A1 | Q93096 | 2/20 | 0.32 |
| ▸ | PTP4A2 | Q12974 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.30 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1275393 | 0.80 | ALDH1A1 (0.42) | TSHRALDH1A1SMN1; SMN2MAPT | |
| SCHEMBL1275385 | 0.77 | HCAR2 (0.36) | TSHRALDH1A1TDP1 | |
| SCHEMBL1275023 | 0.75 | ALDH1A1 (0.42) | TSHRALDH1A1CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL4636489 | 0.74 | ALDH1A1 (0.31) | TSHRALDH1A1 | |
| SCHEMBL1275701 | 0.74 | TSHR (0.32) | TSHRALDH1A1 | |
| SCHEMBL7071087 | 0.73 | TSHR (0.37) | TSHRALDH1A1CYP3A4PTP4A3PTP4A1 | |
| SCHEMBL27993814 | 0.72 | TSHR (0.43) | TSHRALDH1A1CYP3A4PTP4A3PTP4A1 | |
| SCHEMBL5008753 | 0.70 | TSHR (0.47) | TSHRALDH1A1CYP3A4PKMSMN1; SMN2 | |
| Propionic Acid SCHEMBL27993809 | 0.70 | TSHR (0.58) | TSHRALDH1A1CYP3A4PTP4A3PTP4A1 | |
| Hydrogen Sulfide SCHEMBL28143183 | 0.69 | TSHR (0.50) | TSHRALDH1A1CYP3A4PTP4A3PTP4A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2003050619-A2 | A METHOD FOR PRODUCING A MASK FOR HIGH RESOLUTION LITHOGRAPHY, A MASK OBTAINED THEREBY AND A MULTI-LAYER ELEMENT FOR HIGH RESOLUTION LITHOGRAPHY | INFM ISTITUTO NAZIONALE PER LA FISICA DELLA MATERIA (IT) | 2003-06-19 | — | — | WO | disclosed |