SCHEMBL707232

SCHEMBL707232

CC(=O)O[Si](OC(C)=O)(OC(C)=O)C(C)(C)C

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35
TSHR P16473 1/20 0.35
GAA P10253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL713405 0.77 ALDH1A1 (0.35) ALDH1A1TSHRGAA
SCHEMBL476038 0.77 ALDH1A1 (0.35) ALDH1A1TSHRGAA
SCHEMBL1053795 0.74 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL19809475 0.74 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL475925 0.74 ALDH1A1 (0.33) ALDH1A1TSHRGAA
SCHEMBL3222708 0.74 ALDH1A1 (0.35) ALDH1A1GAA
SCHEMBL706474 0.70 GAA (0.34) ALDH1A1TSHRGAA
SCHEMBL704938 0.70 ALDH1A1 (0.36) ALDH1A1TSHRGAA
SCHEMBL702411 0.70 GAA (0.34) ALDH1A1TSHRGAA
SCHEMBL711587 0.70 GAA (0.34) ALDH1A1TSHRGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106751687-B A kind of PC/ABS alloy material of noise-reduction and preparation method thereof 上海锦湖日丽塑料有限公司 2019-03-08 CN disclosed
US-8283260-B2 Process for restoring dielectric properties AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-10-09 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-20100041234-A1 Process For Restoring Dielectric Properties AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-18 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20090298671-A1 Compositions for Preparing Low Dielectric Materials Containing Solvents AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-12-03 US disclosed
US-7572303-B2 A symmetrical dialkyl carbonate, a metal, borong, silicon, or group 7 compound, a hydrogen or hydrocarbon-based fuel, an oxidizer, and a metallic cocatalyst; minimized hydrolysis; improved combustion and storage stability OCTANE INTERNATIONAL, LTD. (US) 2009-08-11 US disclosed
US-7500397-B2 Activated chemical process for enhancing material properties of dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-03-10 US disclosed
US-7482676-B2 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-01-27 US disclosed
US-20040048960-A1 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. 2004-03-11 US disclosed
EP-1376671-A1 Compositions for preparing materials with a low dielectric constant AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-01-02 EP disclosed
US-6652608-B1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2003-11-25 US disclosed
EP-1359166-A1 OLEFIN POLYMERIZATION CATALYST, CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, METHOD OF STORING THESE, AND PROCESS FOR PRODUCING OLEFIN POLYMER Sunallomer Ltd (JP) 2003-11-05 EP disclosed
EP-1051461-A2 FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE ORR, William C. (US) 2000-11-15 EP disclosed
WO-1999066009-A2 FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE ORR WILLIAM C (US) 1999-12-23 WO disclosed
EP-0954558-A1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR, William C. (US) 1999-11-10 EP disclosed
WO-1998026028-A1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR WILLIAM C (US) 1998-06-18 WO disclosed
EP-0106047-B1 OLEFINICALLY UNSATURATED SILOXANES, PROCESS FOR THEIR PREPARATION AND THEIR USE AS REACTIVE DILUENTS IN RADICALLY CROSS-LINKABLE LACQUERING SYSTEMS BAYER AG (DE) 1985-10-23 EP disclosed
EP-0106047-A1 Olefinically unsaturated siloxanes, process for their preparation and their use as reactive diluents in radically cross-linkable lacquering systems BAYER AG (DE) 1984-04-25 EP disclosed