SCHEMBL707272

SCHEMBL707272

CCCO[SiH](CC)OCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19809180 0.91
SCHEMBL6298254 0.89 THRB (0.42)
SCHEMBL28994587 0.87
SCHEMBL1608617 0.85
SCHEMBL706257 0.81 ADRB2 (0.41)
SCHEMBL705036 0.80
SCHEMBL705839 0.80
SCHEMBL1608607 0.79 THRB (0.37)
SCHEMBL692448 0.78
SCHEMBL11683257 0.77 THRB (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 337 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107216459-B Preparation method of perfluoropolyether fluorine-based fluorosilane with multiple hydrolysis active end groups 太仓中化环保化工有限公司 2021-02-26 CN claimed
CN-107216459-A A kind of preparation method of the perfluor Polyfluoroether base silicon fluoride with many hydrolysing activity end groups 太仓中化环保化工有限公司 2017-09-29 CN claimed
EP-2307428-A1 PROCESS FOR PREPARING ALKYLAMINOALKYLALKOXYSILANES Evonik Degussa GmbH (DE) 2011-04-13 EP claimed
WO-2009146971-A1 PROCESS FOR PREPARING ALKYLAMINOALKYLALKOXYSILANES EVONIK DEGUSSA GMBH (DE) 2009-12-10 WO claimed
EP-3812428-B1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE PANASONIC IP MAN CO LTD (JP) 2025-12-03 EP disclosed
CN-116075368-B Resin composition, cured product, method for producing same, and laminate 三菱化学株式会社 2024-06-11 CN disclosed
WO-2024080149-A1 ANTI-REFLECTION FILM, LIQUID COMPOSITION, LIQUID COMPOSITION GROUP, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM 日本板硝子株式会社 2024-04-18 WO disclosed
US-11912889-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-27 US disclosed
CN-112424290-B Colloid structure, colloid multiple structure, and method for producing colloid structure 松下知识产权经营株式会社 2023-08-22 CN disclosed
US-20230257503-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE MITSUBISHI CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
EP-4212256-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE Mitsubishi Chemical Corporation (JP) 2023-07-19 EP disclosed
CN-116075368-A Resin composition, cured product, method for producing same, and laminate 三菱化学株式会社 2023-05-05 CN disclosed
EP-0478284-B1 Organic silicon compounds and cosmetic compositions SHINETSU CHEMICAL CO (JP) 1995-12-06 EP disclosed
US-5470616-A Coated shaped articles and method of making same MITSUBISHI RAYON CO., LTD. (JP) 1995-11-28 US disclosed
EP-0604677-A1 Coated shaped articles and method of making same MITSUBISHI RAYON CO., LTD. (JP) 1994-07-06 EP disclosed
US-5254542-A Having ultraviolet absorbing benzotriazole or benzophenone group SHIN-ETSU CHEMICAL CO., LTD. 1993-10-19 US disclosed
EP-0478284-A2 Organic silicon compounds and cosmetic compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1992-04-01 EP disclosed
US-4642363-A Method of preparing trialkyl organo-oxysilanes DYNAMIT NOBEL AG (DE) 1987-02-10 US disclosed
EP-0070994-A1 Process for preparing 1,3-diene-homo or copolymers containing reactive silyl groups HÜLS AKTIENGESELLSCHAFT (DE) 1983-02-09 EP disclosed
US-4183844-A SILICON BOUND POLYBUTADIENE OIL CHEMISCHE WERKE HULS AKTIENGESELLSCHAFT (DE) 1980-01-15 US disclosed