Medronic Acid

Medronic Acid

SCHEMBL7081257

NCCNCCN.O=P(O)(O)CP(=O)(O)O.O=P(O)(O)CP(=O)(O)O.O=P(O)(O)CP(=O)(O)O

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ANPEP P15144 1/20 0.56
CA12 O43570 4/20 0.53
CA6 P23280 4/20 0.53
CA7 P43166 4/20 0.53
CA9 Q16790 4/20 0.53
CA14 Q9ULX7 4/20 0.53
CA5B Q9Y2D0 4/20 0.53
KDM4E B2RXH2 2/20 0.53
HSD17B10 Q99714 2/20 0.53
MEN1 O00255 2/20 0.53
RECQL P46063 2/20 0.53
KMT2A Q03164 2/20 0.53
MMP2 P08253 1/20 0.53
THRB P10828 1/20 0.53
MAPK1 P28482 1/20 0.53
LMNA P02545 3/20 0.50
CA2 P00918 3/20 0.50
CA4 P22748 3/20 0.50
CA5A P35218 3/20 0.50
TDP1 Q9NUW8 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Medronic Acid SCHEMBL9347974 1.00 ANPEP (0.56) ANPEPCA12CA6CA7CA9
Medronic Acid SCHEMBL1138068 1.00 ANPEP (0.56) ANPEPCA12CA6CA7CA9
Medronic Acid SCHEMBL3889431 1.00 ANPEP (0.56) ANPEPCA12CA6CA7CA9
Medronic Acid SCHEMBL1496457 1.00 ANPEP (0.56) ANPEPCA12CA6CA7CA9
Medronic Acid SCHEMBL220473 1.00 ANPEP (0.56) ANPEPCA12CA6CA7CA9
Medronic Acid SCHEMBL3539311 0.97 CA12 (0.55) ANPEPCA12CA6CA7CA9
Medronic Acid SCHEMBL2944253 0.97 ANPEP (0.54) ANPEPCA12CA6CA7CA9
Medronic Acid SCHEMBL2126902 0.97 ANPEP (0.54) ANPEPCA12CA6CA7CA9
Trientine SCHEMBL9564313 0.97 CA12 (0.55) ANPEPCA12CA6CA7CA9
Trientine SCHEMBL242925 0.97 CA12 (0.55) ANPEPCA12CA6CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9150758-B2 Polishing composition, polishing method using same, and method for producing semiconductor device FUJIMI INCORPORATED (JP) 2015-10-06 US claimed
US-20140141612-A1 POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE FUJIMI CORPORATION 2014-05-22 US claimed
EP-2693460-A1 POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE Fujimi Incorporated (JP) 2014-02-05 EP claimed
US-9150758-B2 Polishing composition, polishing method using same, and method for producing semiconductor device FUJIMI INCORPORATED (JP) 2015-10-06 US disclosed
US-20140141612-A1 POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE FUJIMI CORPORATION 2014-05-22 US disclosed
EP-2693460-A1 POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE Fujimi Incorporated (JP) 2014-02-05 EP disclosed
US-20030216275-A1 Nª,n -dialkyl aminomethylenephosphonic acids and use thereof CRUMP DRUCE K (US) 2003-11-20 US disclosed