SCHEMBL7092326

SCHEMBL7092326

C=CCC(=O)CC(=O)CC

nearest known ligand 0.43

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.43
ALDH1A1 P00352 2/20 0.40
TSHR P16473 1/20 0.40
FAAH O00519 1/20 0.31
KMT2A Q03164 1/20 0.31
FFAR3 O14843 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL395513 0.87
SCHEMBL11973891 0.87 ALDH1A1 (0.35) TDP1ALDH1A1TSHRKMT2A
SCHEMBL11783694 0.81 FAAH (0.37) ALDH1A1TSHRFAAHFFAR3
SCHEMBL28717818 0.80 TDP1 (0.43) TDP1ALDH1A1TSHRFAAHFFAR3
SCHEMBL93369 0.78
SCHEMBL8966176 0.77
SCHEMBL11653006 0.76 ALDH1A1 (0.39) TDP1ALDH1A1TSHRFAAH
Butane SCHEMBL7638581 0.76 TSHR (0.39) TDP1ALDH1A1TSHRFAAHFFAR3
Methyl Alcohol SCHEMBL27813915 0.75 ALDH1A1 (0.37) TDP1ALDH1A1TSHR
SCHEMBL28028302 0.75 KDM4E (0.41) TDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100558837-C Heat-resistant lubricity imparting coating agent and thermal transfer recording medium NATOCO CO LTD (JP) 2009-11-11 CN disclosed
CN-1914286-A Heat resistance lubricity imparting coating agent and thermal transfer recording medium NATOCO CO LTD (JP) 2007-02-14 CN disclosed
EP-0854388-B1 Negative-type image recording materials FUJI PHOTO FILM CO LTD (JP) 2003-08-13 EP disclosed
US-6068963-A CONTAINS (A) A POLYMER HAVING A HETEROCYCLIC GROUP CONTAINING AN UNSATURATED BOND THEREIN, (B) A CROSS-LINKING AGENT THAT CROSS-LINKS WITH THE AID OF AN ACID, AND (C) A COMPOUND THAT GENERATES AN ACID UPON EXPOSURE TO LIGHT OR HEAT. FUJI PHOTO FILM CO., LTD. (JP) 2000-05-30 US disclosed
EP-0854388-A2 Negative-type image recording materials FUJI PHOTO FILM CO., LTD. (JP) 1998-07-22 EP disclosed