SCHEMBL7094080

SCHEMBL7094080

CC(=CCCCCNC(=O)Nc1cccc(O)c1)C(=O)O

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MARS1 P56192 1/20 0.51
EPHX1 P07099 6/20 0.48
KMT2A Q03164 3/20 0.48
MEN1 O00255 2/20 0.48
ALDH1A1 P00352 3/20 0.47
HTT P42858 2/20 0.47
CYP1A2 P05177 1/20 0.47
LMNA P02545 2/20 0.46
TP53 P04637 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
MAPT P10636 2/20 0.46
EPHX2 P34913 2/20 0.44
NPC1 O15118 1/20 0.43
MAPK1 P28482 1/20 0.43
RAB9A P51151 1/20 0.43
HSD17B10 Q99714 1/20 0.43
SIRT5 Q9NXA8 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7094078 1.00 MARS1 (0.51) MARS1EPHX1KMT2AMEN1ALDH1A1
SCHEMBL7098402 0.91 ALDH1A1 (0.50) MARS1EPHX1KMT2AMEN1ALDH1A1
SCHEMBL7098399 0.91 ALDH1A1 (0.50) MARS1EPHX1KMT2AMEN1ALDH1A1
SCHEMBL7096379 0.85 EPHX1 (0.48) EPHX1KMT2AMEN1ALDH1A1HTT
SCHEMBL7096382 0.85 EPHX1 (0.48) EPHX1KMT2AMEN1ALDH1A1HTT
SCHEMBL7098036 0.82 EPHX2 (0.48) EPHX1KMT2AMEN1ALDH1A1HTT
SCHEMBL7098030 0.82 EPHX2 (0.48) EPHX1KMT2AMEN1ALDH1A1HTT
SCHEMBL8599536 0.78 EPHX1 (0.75) MARS1EPHX1ALDH1A1HTTMAPT
SCHEMBL3157400 0.78 EPHX1 (0.75) MARS1EPHX1ALDH1A1HTTMAPT
SCHEMBL8601252 0.78 EPHX1 (0.75) MARS1EPHX1ALDH1A1HTTMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0737896-B1 Photosensitive composition and photosensitive planographic printing plate KODAK POLYCHROME GRAPHICS JP (JP) 2003-08-27 EP disclosed
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed