⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4931013 | 0.69 | — | — | |
| SCHEMBL7055091 | 0.67 | — | — | |
| SCHEMBL252911 | 0.65 | — | — | |
| SCHEMBL7632251 | 0.63 | — | — | |
| SCHEMBL28408888 | 0.62 | — | — | |
| SCHEMBL7095253 | 0.61 | — | — | |
| SCHEMBL4350952 | 0.55 | — | — | |
| SCHEMBL2146960 | 0.54 | — | — | |
| SCHEMBL3746961 | 0.54 | — | — | |
| SCHEMBL9936034 | 0.52 | MEN1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2960224-B1 | HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE | ZEON CORP (JP) | 2019-03-27 | — | — | EP | disclosed |
| US-9944852-B2 | High-purity 1H-heptafluorocyclopentene | ZEON CORPORATION (JP) | 2018-04-17 | — | — | US | disclosed |
| EP-2643732-B1 | PROCESS FOR FORMING UNEVEN STRUCTURE ON SURFACE OF SURFACE LAYER OF CYLINDRICAL ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, AND PROCESS FOR PRODUCING CYLINDRICAL ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER HAVING UNEVEN STRUCTURE FORMED ON SURFACE OF SURFACE LAYER OF SAME | CANON KK (JP) | 2018-01-10 | — | — | EP | disclosed |
| US-20160002530-A1 | HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE | ZEON CORPORATION (JP) | 2016-01-07 | — | — | US | disclosed |
| EP-2960224-A1 | HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE | Zeon Corporation (JP) | 2015-12-30 | — | — | EP | disclosed |
| US-9114565-B2 | Process for forming uneven structure on surface of surface layer of cylindrical electrophotographic photosensitive member, and process for producing cylindrical electrophotographic photosensitive member having uneven structure formed on surface of surface layer of same | CANON KABUSHIKI KAISHA (JP) | 2015-08-25 | — | — | US | disclosed |
| EP-2643732-A1 | PROCESS FOR FORMING UNEVEN STRUCTURE ON SURFACE OF SURFACE LAYER OF CYLINDRICAL ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, AND PROCESS FOR PRODUCING CYLINDRICAL ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER HAVING UNEVEN STRUCTURE FORMED ON SURFACE OF SURFACE LAYER OF SAME | Canon Kabushiki Kaisha (JP) | 2013-10-02 | — | — | EP | disclosed |
| US-20130221560-A1 | PROCESS FOR FORMING UNEVEN STRUCTURE ON SURFACE OF SURFACE LAYER OF CYLINDRICAL ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, AND PROCESS FOR PRODUCING CYLINDRICAL ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER HAVING UNEVEN STRUCTURE FORMED ON SURFACE OF SURFACE LAYER OF SAME | CANON KABUSHIKI KAISHA (JP) | 2013-08-29 | — | — | US | disclosed |
| WO-2012070663-A1 | PROCESS FOR FORMING UNEVEN STRUCTURE ON SURFACE OF SURFACE LAYER OF CYLINDRICAL ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, AND PROCESS FOR PRODUCING CYLINDRICAL ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER HAVING UNEVEN STRUCTURE FORMED ON SURFACE OF SURFACE LAYER OF SAME | CANON KABUSHIKI KAISHA (JP) | 2012-05-31 | — | — | WO | disclosed |