SCHEMBL7101024

SCHEMBL7101024

O=C1C=CC=C2c3ccccc3OC(=O)C12

nearest known ligand 0.32

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.32
ALOX15 P16050 1/20 0.32
ALDH1A1 P00352 1/20 0.32
GAA P10253 1/20 0.32
STK17B O94768 2/20 0.32
KDM4E B2RXH2 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2D6 P10635 1/20 0.31
PKM P14618 1/20 0.30
TSHR P16473 1/20 0.30
MEN1 O00255 1/20 0.30
HDAC3 O15379 1/20 0.30
RECQL P46063 1/20 0.30
HDAC4 P56524 1/20 0.30
KMT2A Q03164 1/20 0.30
HDAC1 Q13547 1/20 0.30
HDAC7 Q8WUI4 1/20 0.30
HDAC2 Q92769 1/20 0.30
HDAC10 Q969S8 1/20 0.30
HDAC11 Q96DB2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27796709 0.77
SCHEMBL6688204 0.74 MAPT (0.45) ALDH1A1GAAKDM4ECYP1A2MEN1
SCHEMBL4711832 0.73 TTK (0.35) TDP1ALOX15ALDH1A1STK17BKDM4E
SCHEMBL4619988 0.73 CYP19A1 (0.37) ALDH1A1STK17BKDM4EPKMTSHR
SCHEMBL3274379 0.68 MAPT (0.42) TDP1ALDH1A1GAAKDM4ECYP1A2
SCHEMBL6049871 0.68 CYP19A1 (0.38) ALDH1A1STK17BKDM4ECYP1A2PKM
SCHEMBL5969253 0.67 MAPT (0.41) TDP1ALDH1A1GAAKDM4ECYP1A2
SCHEMBL271402 0.67 CYP2C9 (0.44) ALOX15ALDH1A1GAAKDM4EPKM
SCHEMBL18224247 0.66 MAPT (0.59) ALDH1A1GAASTK17BKDM4ECYP1A2
SCHEMBL731490 0.66 PIM1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0934955-B1 Polymerization process characterized by a two layer coating against scale formation deposited using a steam carrier SHINETSU CHEMICAL CO (JP) 2003-04-16 EP disclosed
EP-0872903-B1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder SHINETSU CHEMICAL CO (JP) 2001-10-04 EP disclosed
US-6277519-B1 QUENCHING AN ALLOY MELT; COMMINUTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-21 US disclosed
US-6037426-A POLYMERIZING MONOMER HAVING ETHYLENIC DOUBLE BOND IN POLYMERIZATION VESSEL HAVING BILAYER POLYMER SCALE PREVENTIVE COATING FILM ON INNER WALL SURFACES SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-03-14 US disclosed
EP-0934955-A1 Polymerization process characterized by a two layer coating against scale formation deposited using a steam carrier SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-08-11 EP disclosed
EP-0872903-A1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder Shin-Etsu Chemical Co., Ltd. (JP) 1998-10-21 EP disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed