SCHEMBL710218

SCHEMBL710218

CC/C=C(\C)[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL710219 1.00
SCHEMBL3417252 1.00
Bicarbonate SCHEMBL9752391 0.73 KDM4E (0.41)
SCHEMBL712066 0.73
SCHEMBL712065 0.73
SCHEMBL3599230 0.71
SCHEMBL3599231 0.71
SCHEMBL1352562 0.69 ALDH1A1 (0.31)
SCHEMBL21427696 0.69 ALDH1A1 (0.31)
SCHEMBL403101 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 272 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11820953-B2 Fluorine-containing ether compound, lubricant for magnetic recording medium and magnetic recording medium RESONAC CORPORATION (JP) 2023-11-21 US disclosed
CN-113544190-B Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium 株式会社力森诺科 2023-08-01 CN disclosed
CN-116057056-A Azabicyclo-substituted heterocyclic compounds as fungicides 拜耳公司 2023-05-02 CN disclosed
CN-111094363-B Iron compounds as hydrosilylation, dehydrosilylation and crosslinking catalysts for silicone compositions 埃肯有机硅法国有限公司 2022-07-29 CN disclosed
US-20220169941-A1 FLUORINE-CONTAINING ETHER COMPOUND, LUBRICANT FOR MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING MEDIUM SHOWA DENKO K.K. (JP) 2022-06-02 US disclosed
CN-113544190-A Fluorinated ether compound, lubricant for magnetic recording medium, and magnetic recording medium 昭和电工株式会社 2021-10-22 CN disclosed
CN-110062790-B Stabilizer composition 巴斯夫欧洲公司 2021-09-24 CN disclosed
CN-110062796-B Hardenable polymer composition 巴斯夫欧洲公司 2021-09-03 CN disclosed
CN-113302234-A Stabilizer composition for sealants and adhesives 巴斯夫欧洲公司 2021-08-24 CN disclosed
EP-3526288-B1 STABILIZER COMPOSITION BASF SE (DE) 2021-08-04 EP disclosed
EP-0537463-A2 Substituted pyrido(2,3-d)pyrimidines as antidotes BASF Aktiengesellschaft (DE) 1993-04-21 EP disclosed
EP-0499823-A2 Imino-substituted phenyl derivatives, their preparation and fungicides containing them BASF Aktiengesellschaft (DE) 1992-08-26 EP disclosed
EP-0481354-A1 Unsaturated cyclohexenonoximethers BASF Aktiengesellschaft (DE) 1992-04-22 EP disclosed
EP-0475158-A2 Use of alpha aryl acrylic acid derivatives for pest control BASF Aktiengesellschaft (DE) 1992-03-18 EP disclosed
EP-0432893-A2 Benzoxazine derivatives, their preparation and pharmaceutical compositions containing them YAMANOUCHI PHARMACEUTICAL CO. LTD. (JP) 1991-06-19 EP disclosed
EP-0163433-B1 ANTIBACTERIAL SOLID COMPOSITION FOR ORAL ADMINISTATION Takeda Chemical Industries, Ltd. (JP) 1990-08-01 EP disclosed
US-4914116-A Nitrogen-containing heterocyclic compounds, and their use as insecticides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1990-04-03 US disclosed
US-4714706-A JUVENILE HORMONE INHIBITORS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1987-12-22 US disclosed
EP-0203798-A2 Nitrogen-containing heterocyclic compounds, and their production and use SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1986-12-03 EP disclosed
US-4616008-A LIPID-SOLUBLE CEPHALOSPORINS AND CYCLODEXTRINS TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1986-10-07 US disclosed