⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL554691 | 1.00 | — | — | |
| SCHEMBL1556036 | 0.82 | GRIK1 (0.35) | — | |
| SCHEMBL7048132 | 0.81 | — | — | |
| SCHEMBL1099875 | 0.80 | TSHR (0.33) | — | |
| SCHEMBL27656796 | 0.79 | ALOX15 (0.48) | — | |
| SCHEMBL1135174 | 0.79 | ALOX15 (0.48) | — | |
| SCHEMBL6048387 | 0.79 | GRIK1 (0.39) | — | |
| SCHEMBL27637941 | 0.79 | ALOX15 (0.33) | — | |
| SCHEMBL800066 | 0.78 | — | — | |
| SCHEMBL164680 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102140181-B | Polyvinylidene fluoride (PVDF) hydrophilic modified membrane and preparation method thereof | UNIV TIANJIN POLYTECHNIC | 2013-04-17 | — | — | CN | claimed |
| CN-102140181-A | Polyvinylidene fluoride (PVDF) hydrophilic modified membrane and preparation method thereof | UNIV TIANJIN POLYTECHNIC | 2011-08-03 | — | — | CN | claimed |
| CN-104698774-B | semiconductor device process filter and method | 台湾积体电路制造股份有限公司 | 2019-10-25 | — | — | CN | disclosed |
| CN-109782553-A | Photoresist developer | 台湾积体电路制造股份有限公司 | 2019-05-21 | — | — | CN | disclosed |
| CN-109782540-A | The forming method of photoetching agent pattern | 台湾积体电路制造股份有限公司 | 2019-05-21 | — | — | CN | disclosed |
| CN-105047540-B | Anti-reflecting layer and method | 台湾积体电路制造股份有限公司 | 2018-05-25 | — | — | CN | disclosed |
| CN-104752171-B | gap filling material and method | 台湾积体电路制造股份有限公司 | 2018-02-27 | — | — | CN | disclosed |
| CN-105093826-A | Photoresist and Method | TAIWAN SEMICONDUCTOR MFG | 2015-11-25 | — | — | CN | disclosed |
| CN-105047540-A | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MFG | 2015-11-11 | — | — | CN | disclosed |
| CN-104752171-A | Gap Filling Materials and Methods | TAIWAN SEMICONDUCTOR MFG | 2015-07-01 | — | — | CN | disclosed |
| CN-104689619-A | Filter with sealing treatment | TAIWAN SEMICONDUCTOR MFG CO LTD | 2015-06-10 | — | — | CN | disclosed |
| CN-102140181-B | Polyvinylidene fluoride (PVDF) hydrophilic modified membrane and preparation method thereof | UNIV TIANJIN POLYTECHNIC | 2013-04-17 | — | — | CN | disclosed |
| CN-102140181-A | Polyvinylidene fluoride (PVDF) hydrophilic modified membrane and preparation method thereof | UNIV TIANJIN POLYTECHNIC | 2011-08-03 | — | — | CN | disclosed |
| CN-102112191-A | Graft copolymers for ion exchange chromatography | MERCK PATENT GMBH | 2011-06-29 | — | — | CN | disclosed |
| CN-1938224-B | Method for treating surface of base, surface-treated base, material and instrument for medical use | TOYO ADVANCED TECH CO | 2011-03-30 | — | — | CN | disclosed |
| CN-1133221-C | Nonaqueous secondary battery | FUJI PHOTO FILM CO LTD (JP) | 2003-12-31 | — | — | CN | disclosed |
| US-20030232193-A1 | Dry film resist and printed circuit board producing method | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-18 | — | — | US | disclosed |
| CN-1189247-A | Nonaqueous secondary battery | FUJI PHOTO FILM CO LTD (JP) | 1998-07-29 | — | — | CN | disclosed |
| CN-1028915-C | Silver halide color photographic material | FUJI PHOTO FILM CO LTD (JP) | 1995-06-14 | — | — | CN | disclosed |
| CN-1055824-A | Silver-halide color photoelement | FUJI PHOTO FILM CO LTD (JP) | 1991-10-30 | — | — | CN | disclosed |