Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL7104489

O=S(=O)([O-])OOS(=O)(=O)[O-].O=S(=O)([O-])OOS(=O)(=O)[O-].O=S(=O)([O-])OOS(=O)(=O)[O-].O=[N+]([O-])[O-].[Fe+3].[Fe+3].[NH4+]

nearest known ligand 0.44

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Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
ALDH1A1 P00352 1/20 0.30
TSHR P16473 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8038652 0.97 MEN1 (0.38) MEN1KMT2AALDH1A1TSHRTDP1
Ammonia Solution, Strong SCHEMBL28956104 0.94 MEN1 (0.44) MEN1KMT2AALDH1A1TSHRTDP1
Potassium Ion SCHEMBL7816211 0.90 MEN1 (0.38) MEN1KMT2AALDH1A1TSHRTDP1
Silver SCHEMBL10906729 0.88 MEN1 (0.35) MEN1KMT2AALDH1A1TSHRTDP1
Potassium Ion SCHEMBL27950802 0.88 MEN1 (0.35) MEN1KMT2AALDH1A1TSHRTDP1
Silver SCHEMBL153661 0.88 MEN1 (0.35) MEN1KMT2AALDH1A1TSHRTDP1
Ammonia Solution, Strong SCHEMBL6862918 0.87 MEN1 (0.31) MEN1KMT2AALDH1A1TSHR
Sulfuric Acid SCHEMBL8407732 0.83
SCHEMBL385808 0.83 MEN1 (0.33) MEN1KMT2AALDH1A1TSHR
Ammonia Solution, Strong SCHEMBL4377162 0.79 MEN1 (0.31) MEN1KMT2AALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0970156-B1 CHEMICAL-MECHANICAL POLISHING SLURRY FORMULATION AND METHOD FOR TUNGSTEN AND TITANIUM THIN FILMS ADVANCED MICRO DEVICES INC (US) 2003-09-24 EP disclosed
US-6017463-A FORMING A SLURRY INCLUDING ABRASIVE PARTICLES HAVING A SOLUBILITY COATING, IN AN AQUEOUS CONCENTRATE HAVING SPECIFIC PARTICLE SIZE, BLENDED WITH SUSPENSION AGENT, MIXED WITH DEIZONIZED WATER; MIXING WITH OXIDZER; SUPPLYING TO THE PAD ADVANCED MICRO DEVICES, INC. (US) 2000-01-25 US disclosed
EP-0970156-A1 CHEMICAL-MECHANICAL POLISHING SLURRY FORMULATION AND METHOD FOR TUNGSTEN AND TITANIUM THIN FILMS ADVANCED MICRO DEVICES, INC. (US) 2000-01-12 EP disclosed
US-5916855-A ABRASIVE PARTICLES HAVING SOLUBILITY COATING COMPRISING PHTHALATE-CONTAINING COMPOUND, FERRIC SALT OXIDIZER, SUSPENSION AGENT, TITANIUM OXIDIER ADVANCED MICRO DEVICES, INC. (US) 1999-06-29 US disclosed
WO-1998042791-A1 CHEMICAL-MECHANICAL POLISHING SLURRY FORMULATION AND METHOD FOR TUNGSTEN AND TITANIUM THIN FILMS ADVANCED MICRO DEVICES, INC. (US) 1998-10-01 WO disclosed
WO-1998042790-A1 CHEMICAL-MECHANICAL POLISHING SLURRY FORMULATION AND METHOD FOR TUNGSTEN AND TITANIUM THIN FILMS ADVANCED MICRO DEVICES, INC. (US) 1998-10-01 WO disclosed