SCHEMBL7105629

SCHEMBL7105629

O=C(O)c1cc(O)c(O)c(O)c1C(=O)c1cc(O)c(O)c(O)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.56
LMNA P02545 3/20 0.56
TDP1 Q9NUW8 3/20 0.56
MAPT P10636 3/20 0.56
SELL P14151 2/20 0.56
SELP P16109 2/20 0.56
ALDH1A1 P00352 2/20 0.56
FUT7 Q11130 2/20 0.56
CA12 O43570 2/20 0.56
CA1 P00915 2/20 0.56
CA2 P00918 2/20 0.56
CA4 P22748 2/20 0.56
CA6 P23280 2/20 0.56
CA7 P43166 2/20 0.56
CA9 Q16790 2/20 0.56
CA14 Q9ULX7 2/20 0.56
TP53 P04637 1/20 0.56
CA3 P07451 1/20 0.56
HPGD P15428 1/20 0.56
FUT4 P22083 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9845807 0.85 AKR1C3 (0.52) KDM4ELMNATDP1MAPTSELL
SCHEMBL6903701 0.83 SELL (0.48) KDM4ELMNATDP1MAPTSELL
SCHEMBL2786050 0.79 KDM4E (0.60) KDM4ELMNATDP1MAPTSELL
SCHEMBL21935531 0.78 KDM4E (0.56) KDM4ELMNATDP1MAPTSELL
SCHEMBL2786053 0.78 POLB (0.53) KDM4ELMNATDP1MAPTSELL
SCHEMBL27739390 0.78 MEN1 (0.45) KDM4ELMNATDP1MAPTSELL
SCHEMBL9638961 0.77 HDAC1 (0.70) KDM4ELMNATDP1MAPTSELL
SCHEMBL19003637 0.75 HDAC1 (0.52) KDM4ELMNATDP1MAPTSELL
SCHEMBL352369 0.75 KDM4E (0.65) KDM4ELMNATDP1MAPTSELL
SCHEMBL29045133 0.74 SELL (0.41) KDM4ELMNATDP1MAPTSELL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0716688-B1 CULTURE MEDIUM AND PROCESS FOR THE PREPARATION OF HIGH MOLECULAR WEIGHT HYALURONIC ACID FIDIA ADVANCED BIOPOLYMERS SRL (IT) 2003-09-24 EP claimed
EP-0716688-A1 PROCESS FOR THE PREPARATION AND PURIFICATION OF HIGH MOLECULAR WEIGHT HYALURONIC ACID FIDIA ADVANCED BIOPOLYMERS S.R.L. (IT) 1996-06-19 EP claimed
WO-1995004132-A1 PROCESS FOR THE PREPARATION AND PURIFICATION OF HIGH MOLECULAR WEIGHT HYALURONIC ACID FIDIA ADVANCED BIOPOLYMERS S.R.L. (IT) 1995-02-09 WO claimed
US-4885244-A CONTACTING MICROORGANISM WITH SACCHARIDE IN POLYHYDRIC AROMATIC COMPOUND CONTAINING MEDIUM; HIGH MOLECULAR WEIGHT MITSUBISHI RAYON CO., LTD. (JP) 1989-12-05 US claimed
CN-115916140-A Personal care compositions based on titanium dioxide and crosslinked polymers of adipic acid and neopentyl glycol 联合利华知识产权控股有限公司 2023-04-04 CN disclosed
EP-4146656-A1 SALTS OF NEUROCEUTICALS AND USES THEREOF Syneurx International (Taiwan) Corp. (TW) 2023-03-15 EP disclosed
CN-113195596-B Branched organosilicon compounds, methods of making branched organosilicon compounds, and compositions comprising branched organosilicon compounds 美国陶氏有机硅公司 2023-02-28 CN disclosed
CN-113330054-B Branched organosilicon compounds, methods of making, and copolymers formed therewith 美国陶氏有机硅公司 2023-02-21 CN disclosed
CN-113348199-B Branched organosilicon compounds, methods of making branched organosilicon compounds, and copolymers formed therewith 美国陶氏有机硅公司 2023-02-17 CN disclosed
CN-113166423-B Branched organosilicon compounds, method for producing branched organosilicon compounds, and compositions containing branched organosilicon compounds 美国陶氏有机硅公司 2023-02-17 CN disclosed
CN-115551471-A Cosmetic compositions and methods comprising Plumeria rubra extract 玫琳凯有限公司 2022-12-30 CN disclosed
CN-115397521-A Topical composition based on porous particles and a crosslinked polymer comprising adipic acid and neopentyl glycol 联合利华知识产权控股有限公司 2022-11-25 CN disclosed
EP-0716688-A1 PROCESS FOR THE PREPARATION AND PURIFICATION OF HIGH MOLECULAR WEIGHT HYALURONIC ACID FIDIA ADVANCED BIOPOLYMERS S.R.L. (IT) 1996-06-19 EP disclosed
EP-0659189-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING ASSOCIATIONS OF METALS AND TANNINS OR TANNIN MIXTURES I.R.2.M. (FR) 1995-06-28 EP disclosed
US-5403695-A Photolithography; high resolution; semiconductors KABUSHIKI KAISHA TOSHIBA (JP) 1995-04-04 US disclosed
WO-1995004132-A1 PROCESS FOR THE PREPARATION AND PURIFICATION OF HIGH MOLECULAR WEIGHT HYALURONIC ACID FIDIA ADVANCED BIOPOLYMERS S.R.L. (IT) 1995-02-09 WO disclosed
WO-1994006809-A2 PHARMACEUTICAL COMPOSITIONS CONTAINING ASSOCIATIONS OF METALS AND TANNINS OR TANNIN MIXTURES I.R.2.M. (FR) 1994-03-31 WO disclosed
EP-0266578-B1 METHOD OF PRODUCING HYALURONIC ACID MITSUBISHI RAYON CO., LTD. (JP) 1993-07-07 EP disclosed
US-4885244-A CONTACTING MICROORGANISM WITH SACCHARIDE IN POLYHYDRIC AROMATIC COMPOUND CONTAINING MEDIUM; HIGH MOLECULAR WEIGHT MITSUBISHI RAYON CO., LTD. (JP) 1989-12-05 US disclosed
EP-0266578-A2 Method of producing hyaluronic acid MITSUBISHI RAYON CO., LTD. (JP) 1988-05-11 EP disclosed