SCHEMBL7106652

SCHEMBL7106652

C=CCC(O)C(O)(CC=C)C(=O)OC(=O)C(O)(CC=C)C(O)CC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28430073 0.79 HTT (0.36)
SCHEMBL11806751 0.73 ALDH1A1 (0.30)
SCHEMBL29161650 0.69
SCHEMBL640918 0.68
SCHEMBL10567539 0.66
SCHEMBL45583 0.64
SCHEMBL247055 0.64 ALDH1A1 (0.32)
SCHEMBL2361873 0.64
SCHEMBL180115 0.63 CPT2 (0.38)
SCHEMBL23581903 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5331488-A None JP disclosed
EP-1057822-B1 PROCESS FOR THE PREPARATION OF ALCOHOL DERIVATIVES KAO CORP (JP) 2003-02-12 EP disclosed
US-6372923-B1 REACTING ALCOHOL WITH EPIHALOHYDRIN OR 1,2-EPOXY COMPOUND IN PRESENCE OF ALUMINUM ALKOXIDE AND SULFURIC ACID OR PHOSPHORIC ACID TO FORM ETHER HAVING ONE MOLAR EPOXIDE ADDUCT KAO CORPORATION (JP) 2002-04-16 US disclosed
EP-1057822-A2 Process for preparing alcohol derivatives Kao Corporation (JP) 2000-12-06 EP disclosed
US-5856284-A Detergent composition including a glycerol derivative, a polyhydric alcohol, and an amphoteric surfactant KAO CORPORATION (JP) 1999-01-05 US disclosed
US-5681804-A SKIN CLEANSER; MOISTURIZING WITHOUT STICKINESS OR TACKINESS AND WITHOUT EXCESS DEGREASING OR DRYNESS KAO CORPORATION (JP) 1997-10-28 US disclosed
EP-0531684-B1 Detergent composition KAO CORP (JP) 1997-10-08 EP disclosed
US-5496492-A MIXTURE OF GLYCEROL DERIVATIVE, POLYHYDRIC ALCOHOL, AND NONIONIC SURFACTANT; SKIN CLEANER; NONSTICKY FEEL KAO CORPORATION (JP) 1996-03-05 US disclosed
JP-H05331488-A LOW-FROTHING NONIONIC SURFACTANT NIPPON SAAFUAKUTANTO KOGYO KK 1993-12-14 JP disclosed
EP-0531684-A1 Detergent composition KAO CORPORATION (JP) 1993-03-17 EP disclosed