⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8613888 | 0.91 | SLC6A4 (0.31) | — | |
| SCHEMBL7696960 | 0.90 | — | — | |
| SCHEMBL8466389 | 0.87 | — | — | |
| SCHEMBL7872751 | 0.84 | — | — | |
| SCHEMBL7638347 | 0.83 | HPSE (0.33) | — | |
| SCHEMBL4404945 | 0.81 | CYP2D6 (0.32) | — | |
| SCHEMBL6744683 | 0.79 | — | — | |
| SCHEMBL6727387 | 0.79 | — | — | |
| SCHEMBL7741390 | 0.78 | CYP1A2 (0.34) | — | |
| SCHEMBL9802837 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6866984-B2 | ArF photoresist copolymers | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2005-03-15 | — | — | US | claimed |
| US-20040131968-A1 | Containing 2-hydroxyethyl-5-norbornene-2-carboxylate units; etch and heat resistance; substrate adhesiveness; tetramethylammonium hydroxide solution development; polymer and monomer synthesis | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2004-07-08 | — | — | US | claimed |
| US-6608158-B2 | High transparency at 193 nm wavelength, provides increased etching resistance; formed without 5-norbonen-2-carboxylate monomers which do not have offensive odors of the free acid | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2003-08-19 | — | — | US | claimed |
| US-20020068803-A1 | Copolymer resin, preparation thereof, and photoresist using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-06-06 | — | — | US | claimed |
| US-6368770-B1 | CARBOXY NORBORNENE COMPOUND | HYUNDAI ELECTRONICS INDUSTRIES CO. LTD. (KR) | 2002-04-09 | — | — | US | claimed |
| US-6348296-B1 | COPOLYMER CONSISTING OF 2,3-DI-TERT-BUTYL-5-NORBORNENE-2,3-DICARBOXYLATE, ANOTHER NORBORNENE MONOMER, AND MALEIC ANHYDRIDE | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-02-19 | — | — | US | claimed |
| US-6165672-A | Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-12-26 | — | — | US | claimed |
| JP-10218947-A | — | — | None | — | — | JP | disclosed |
| CN-109862963-B | Synthesis and characterization of Ru alkylidene complexes | 优美科股份公司及两合公司 | 2022-05-24 | — | — | CN | disclosed |
| CN-109641198-B | Synthesis and characterization of metathesis catalysts | 优美科股份公司及两合公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-114106057-A | Synthesis and characterization of Ru alkylidene complexes | 优美科股份公司及两合公司 | 2022-03-01 | — | — | CN | disclosed |
| US-8124803-B2 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| EP-1078945-B1 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-10-12 | — | — | EP | disclosed |
| US-6369181-B1 | COMONOMERS COMPRISING 5-NORBORNENE-2-CARBOXYLIC ACID ESTERS, 5-NORBORNENE-2,3-DICARBOXYLIC ACID MONOMETHYL ESTER, AND MALEIC ANHYDRIDE; ODORLESS; ULTRAVIOLET RAYS OF KRYPTON FLUORIDE OR ARGON FLUORIDE | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-04-09 | — | — | US | disclosed |
| US-20020028406-A1 | Partially crosslinked polymer for bilayer photoresist | HYNIX SEMICONDUCTOR INC. (KR) | 2002-03-07 | — | — | US | disclosed |
| US-6348296-B1 | COPOLYMER CONSISTING OF 2,3-DI-TERT-BUTYL-5-NORBORNENE-2,3-DICARBOXYLATE, ANOTHER NORBORNENE MONOMER, AND MALEIC ANHYDRIDE | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-02-19 | — | — | US | disclosed |
| US-20010031420-A1 | Partially crosslinked polymer for bilayer photoresist | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-10-18 | — | — | US | disclosed |
| US-6258508-B1 | PHOTORESISTS | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2001-07-10 | — | — | US | disclosed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | disclosed |
| JP-H10218947-A | PHOTOSENSITIVE FILM COPOLYMER, ITS PRODUCTION, PHOTOSENSITIVE FILM, ITS PRODUCTION, METHOD FOR SYNTHESIZING MONOMER, PRODUCTION OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | HYUNDAI ELECTRON IND CO LTD | 1998-08-18 | — | — | JP | disclosed |