SCHEMBL7107805

SCHEMBL7107805

CC(C)CCc1ccc(OC(C)(C)C)cc1

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ ACACB O00763 2/20 0.41
▸ PPARA Q07869 3/20 0.41
▸ HTT P42858 1/20 0.41
▸ SMN1; SMN2 Q16637 1/20 0.41
▸ AOC3 Q16853 1/20 0.40
▸ SLC6A2 P23975 1/20 0.38
▸ SLC6A4 P31645 1/20 0.38
▸ SLC6A3 Q01959 1/20 0.38
▸ MEN1 O00255 3/20 0.37
▸ KMT2A Q03164 3/20 0.37
▸ KDM4E B2RXH2 1/20 0.36
▸ POLB P06746 1/20 0.36
▸ MAPT P10636 1/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ PPARG P37231 1/20 0.36
▸ BCHE P06276 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19043747 0.83 SLC6A4 (0.46) ACACBHTTSMN1; SMN2SLC6A4SLC6A3
SCHEMBL6272156 0.80 ACACB (0.50) ACACBSLC6A2SLC6A4SLC6A3
SCHEMBL11295128 0.79 HTT (0.46) ACACBHTTSMN1; SMN2AOC3MEN1
SCHEMBL8080450 0.78 HTT (0.41) HTTSMN1; SMN2AOC3KDM4E
SCHEMBL879606 0.78 HTT (0.62) HTTSMN1; SMN2AOC3SLC6A4MEN1
SCHEMBL91178 0.78 THRB (0.46) ACACBPPARAKMT2APPARG
SCHEMBL14998990 0.78 PPARA (0.44) ACACBPPARASLC6A2SLC6A4SLC6A3
SCHEMBL11100113 0.78 PPARA (0.40) ACACBPPARAPPARG
SCHEMBL20939972 0.77 MEN1 (0.55) SLC6A2SLC6A4SLC6A3MEN1KMT2A
SCHEMBL15355204 0.76 PPARA (0.43) ACACBPPARASLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3214497-B1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING THE SAME, PATTERNING PROCESS, AND LAMINATE SHINETSU CHEMICAL CO (JP) 2019-08-07 — — EP disclosed
EP-3002308-B1 SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE SHINETSU CHEMICAL CO (JP) 2017-02-08 — — EP disclosed
EP-1113005-B1 Sulfonium salt compounds WAKO PURE CHEM IND LTD (JP) 2003-08-06 — — EP disclosed
EP-1238969-A2 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2002-09-11 — — EP disclosed
EP-1113005-A1 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2001-07-04 — — EP disclosed
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