Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | PPARA | Q07869 | 4/20 | 0.44 |
| ▸ | LPL | P06858 | 1/20 | 0.42 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | ACACB | O00763 | 1/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | MGLL | Q99685 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5702512 | 0.88 | PPARA (0.47) | THRBPPARAALDH1A1CA2KMT2A | |
| SCHEMBL25962842 | 0.86 | ALDH1A1 (0.50) | THRBPPARALPLLIPGALDH1A1 | |
| SCHEMBL25993334 | 0.83 | THRB (0.43) | THRBPPARALPLLIPGALDH1A1 | |
| SCHEMBL12621742 | 0.83 | THRB (0.43) | THRBPPARALPLLIPGALDH1A1 | |
| SCHEMBL23474876 | 0.83 | ADRB3 (0.43) | PPARAALDH1A1KMT2APPARG | |
| SCHEMBL14998990 | 0.83 | PPARA (0.44) | PPARAALDH1A1PPARGACACBTAAR1 | |
| SCHEMBL1126574 | 0.82 | SMN1; SMN2 (0.42) | PPARALPLLIPGALDH1A1PPARG | |
| SCHEMBL18435485 | 0.82 | THRB (0.42) | THRBPPARALPLLIPGALDH1A1 | |
| SCHEMBL6667517 | 0.81 | PPARA (0.66) | PPARAALDH1A1CA2PPARGACACB | |
| SCHEMBL20739970 | 0.81 | PPARA (0.43) | THRBPPARAALDH1A1PPARGACACB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105301905-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2020-11-20 | — | — | CN | disclosed |
| US-20170255097-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING THE SAME, PATTERNING PROCESS, AND LAMINATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| EP-3214497-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING THE SAME, PATTERNING PROCESS, AND LAMINATE | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-09-06 | — | — | EP | disclosed |
| US-20160310612-A1 | PEGYLATED DRUG-LINKERS FOR IMPROVED LIGAND-DRUG CONJUGATE PHARMACOKINETICS | SEATTLE GENETICS, INC. (US) | 2016-10-27 | — | — | US | disclosed |
| US-20160291461-A1 | PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELECTRONIC DEVICE, BLOCK COPOLYMER AND BLOCK COPOLYMER PRODUCTION METHOD | FUJIFILM CORPORATION (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160200877-A1 | SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-07-14 | — | — | US | disclosed |
| US-9377690-B2 | Compositon for forming metal oxide-containing film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| CN-105301905-A | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO | 2016-02-03 | — | — | CN | disclosed |
| US-20150232616-A1 | HYBRID BLOCK COPOLYMER MICELLES WITH MIXED STEREOCHEMISTRY FOR ENCAPSULATION OF HYDROPHOBIC AGENTS | INTEZYNE TECHNOLOGIES, INC. | 2015-08-20 | — | — | US | disclosed |
| US-8980326-B2 | Hybrid block copolymer micelles with mixed stereochemistry for encapsulation of hydrophobic agents | INTEZYNE TECHNOLOGIES, INC. (US) | 2015-03-17 | — | — | US | disclosed |
| EP-1693707-A1 | Positive resist composition, and patterning process using the same | Shinetsu Chemical Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
| EP-1059563-B1 | Agent for reducing substrate dependence of resist | WAKO PURE CHEM IND LTD (JP) | 2006-08-09 | — | — | EP | disclosed |
| EP-0875787-B1 | Method for reducing the substrate dependence of resist | WAKO PURE CHEM IND LTD (JP) | 2005-12-14 | — | — | EP | disclosed |
| CN-1592738-A | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEM IND LTD (JP) | 2005-03-09 | — | — | CN | disclosed |
| EP-1113005-B1 | Sulfonium salt compounds | WAKO PURE CHEM IND LTD (JP) | 2003-08-06 | — | — | EP | disclosed |
| EP-1238969-A2 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | disclosed |
| EP-1059563-A1 | Agent for reducing substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| US-5780206-A | USING AN ANTHRACENE DERIVATIVE AS AN ABSORBER ON HIGHLY REFLECTIVE SURFACES; ALKALI-SOLUBLE POLYMERS; GENERATION OF ACID CATALYSTS; FINE PATTERNS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1998-07-14 | — | — | US | disclosed |
| US-5695910-A | RESIN BECOMES ALKALI SOLUBLE BY ELIMINATING PROTECTIVE GROUPS BY ACTION OF IN SITU GENERATED ACID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160310612-A1 | PEGYLATED DRUG-LINKERS FOR IMPROVED LIGAND-DRUG CONJUGATE PHARMACOKINETICS | EGFR, HDGF, CD47 | THRB 3967/4885PPARA 1192/4885LPL 312/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.