SCHEMBL710852

SCHEMBL710852

CCCCCCCCOC(=O)c1cc[c]cc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.67
NPC1 O15118 1/20 0.67
MAPT P10636 1/20 0.67
RAB9A P51151 1/20 0.67
LMNA P02545 4/20 0.58
TSHR P16473 4/20 0.58
ESR1 P03372 4/20 0.58
CYP1A2 P05177 2/20 0.58
CYP2C19 P33261 2/20 0.58
MAPK1 P28482 2/20 0.58
CYP2D6 P10635 1/20 0.58
NR1H2 P55055 1/20 0.58
RNASEL Q05823 1/20 0.58
SMN1; SMN2 Q16637 1/20 0.58
AKR1C4 P17516 1/20 0.58
AKR1C3 P42330 1/20 0.58
AKR1C2 P52895 1/20 0.58
AKR1C1 Q04828 1/20 0.58
STS P08842 6/20 0.57
CYP3A4 P08684 2/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3225675 1.00 ALDH1A1 (0.67) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL3262610 1.00 ALDH1A1 (0.67) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL8095886 1.00 ALDH1A1 (0.67) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL3221420 1.00 ALDH1A1 (0.67) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL6412993 1.00 ALDH1A1 (0.67) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL1310680 1.00 ALDH1A1 (0.67) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL1312058 0.98 ALDH1A1 (0.64) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL131778 0.93 ESR1 (0.67) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL108412 0.88 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL10591672 0.88 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
US-11860390-B2 Wavelength selective absorption filter, organic electroluminescent display device, and liquid crystal display device FUJIFILM CORPORATION (JP) 2024-01-02 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
US-20230384496-A1 OPTICAL MEMBER FOR USE IN DISPLAY DEVICE AND DISPLAY DEVICE INCLUDING DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-11-30 US disclosed
CN-114174396-B Wavelength selective absorption filter and organic electroluminescent display device 富士胶片株式会社 2023-10-10 CN disclosed
US-20230288610-A1 WAVELENGTH SELECTIVE ABSORPTION FILTER AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-09-14 US disclosed
CN-116568763-A Wavelength selective absorption filter and display device 富士胶片株式会社 2023-08-08 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-20230125712-A1 SELF-LUMINOUS DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-04-27 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
EP-0566063-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1993-10-20 EP disclosed
US-5248778-A POLYALKYLPIPERIDINE COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 1993-09-28 US disclosed
EP-0558076-A2 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1993-09-01 EP disclosed
US-5239072-A Diaminotriazine uv absorbers and stabilizers BASF AKTIENGESELLSCHAFT (DE) 1993-08-24 US disclosed
EP-0528435-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1993-02-24 EP disclosed
EP-0481300-A2 Polyalkylpiperidine-derivatives and their use as light stabilizers BASF Aktiengesellschaft (DE) 1992-04-22 EP disclosed
US-4994359-A Improved developability and storability FUJI PHOTO FILM CO., LTD. (JP) 1991-02-19 US disclosed
EP-0021212-B1 PROCESS FOR PREPARING STABLY STORABLE COPOLYMERS OF 2-CHLORO-1,3-BUTADIENE AND SULFUR BAYER AG (DE) 1984-08-08 EP disclosed
US-4303765-A PEPTIZATION WITH AROMATIC POLYSULFIDE BAYER AKTIENGESELLSCHAFT (DE) 1981-12-01 US disclosed
EP-0021212-A1 Process for preparing stably storable copolymers of 2-chloro-1,3-butadiene and sulfur BAYER AG (DE) 1981-01-07 EP disclosed