SCHEMBL7121986

SCHEMBL7121986

O=C(O)c1ccc(OC(=O)c2ccc3cc(OC(=O)c4cc5ccccc5cc4O)ccc3c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.57
MEN1 O00255 3/20 0.57
KMT2A Q03164 3/20 0.57
TDP1 Q9NUW8 2/20 0.57
F12 P00748 2/20 0.47
NSD2 O96028 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.46
LMNA P02545 1/20 0.46
TP53 P04637 1/20 0.46
CYP3A4 P08684 1/20 0.46
ADORA3 P0DMS8 1/20 0.46
CHRM1 P11229 1/20 0.46
TBXA2R P21731 1/20 0.46
SLC6A2 P23975 1/20 0.46
PDE4A P27815 1/20 0.46
ADRA1A P35348 1/20 0.46
KDR P35968 1/20 0.46
SLC6A3 Q01959 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
HDAC6 Q9UBN7 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15330418 0.93 KMT2A (0.58) MAPTMEN1KMT2ATDP1F12
SCHEMBL6574344 0.87 NSD2 (0.57) MAPTMEN1KMT2ATDP1NSD2
SCHEMBL12732195 0.84 KMT2A (0.64) MAPTMEN1KMT2ATDP1L3MBTL1
SCHEMBL4138214 0.83 KMT2A (0.54) MAPTMEN1KMT2ATDP1F12
SCHEMBL4124502 0.81 KMT2A (0.57) MAPTMEN1KMT2ATDP1F12
SCHEMBL7158949 0.81 MAPT (0.63) MAPTMEN1KMT2ATDP1NSD2
SCHEMBL5698842 0.81 KDM4E (0.65) MAPTMEN1KMT2ATDP1F12
SCHEMBL1098951 0.81 HPGD (0.67) MAPTMEN1KMT2ATDP1NSD2
Benzoic Acid SCHEMBL9956914 0.79 KMT2A (0.90) MAPTMEN1KMT2ATDP1L3MBTL1
SCHEMBL10778099 0.79 KMT2A (0.77) MAPTMEN1KMT2ATDP1F12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6664341-B2 Suppresses blistering during soldering; heat resistance; moldability KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUSHO (JP) 2003-12-16 US disclosed
US-20020190239-A1 Liquid-crystal polyester resin composition UENO FINE CHEMICALS INDUSTRY, LTD. (JP) 2002-12-19 US disclosed
EP-1195408-A1 LIQUID-CRYSTAL POLYESTER RESIN COMPOSITION KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUSHO (JP) 2002-04-10 EP disclosed