SCHEMBL714231

SCHEMBL714231

Nc1ccc(Cc2ccc(N)cc2C(=O)O)c(C(=O)O)c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.59
KDM4E B2RXH2 6/20 0.59
MAPT P10636 5/20 0.59
KMT2A Q03164 4/20 0.59
TDP1 Q9NUW8 4/20 0.59
MEN1 O00255 3/20 0.59
THRB P10828 2/20 0.59
RECQL P46063 2/20 0.59
CYP3A4 P08684 2/20 0.59
HPGD P15428 2/20 0.59
HSD17B10 Q99714 2/20 0.59
MCL1 Q07820 2/20 0.59
CYP2C9 P11712 2/20 0.59
HIF1A Q16665 2/20 0.59
USP2 O75604 1/20 0.59
POLB P06746 1/20 0.59
PKM P14618 1/20 0.59
APEX1 P27695 1/20 0.59
BLM P54132 1/20 0.59
TNF P01375 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4761561 0.89 ALDH1A1 (0.52) ALDH1A1KDM4EMAPTKMT2ATDP1
SCHEMBL8477515 0.86 KDM4E (0.57) ALDH1A1KDM4EMAPTKMT2ATDP1
SCHEMBL9469346 0.86 ALDH1A1 (0.57) ALDH1A1KDM4EMAPTKMT2ATDP1
SCHEMBL34474732 0.86 KDM4E (0.57) ALDH1A1KDM4EMAPTKMT2ATDP1
SCHEMBL8477518 0.86 KDM4E (0.57) ALDH1A1KDM4EMAPTKMT2ATDP1
SCHEMBL27569546 0.84 KDM4E (0.55) ALDH1A1KDM4EMAPTKMT2ATDP1
SCHEMBL27596046 0.84 KDM4E (0.55) ALDH1A1KDM4EMAPTKMT2ATDP1
SCHEMBL27607764 0.84 KDM4E (0.55) ALDH1A1KDM4EMAPTKMT2ATDP1
SCHEMBL2386426 0.84 KDM4E (0.55) ALDH1A1KDM4EMAPTKMT2ATDP1
Hydrochloric Acid SCHEMBL27656349 0.84 MAPT (0.60) ALDH1A1KDM4EMAPTKMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118318000-A Crosslinkable thermoplastic 株式会社钟化 2024-07-09 CN disclosed
US-20230084211-A1 MALLEABLE AND DEGRADABLE BENZOXAZINES KANEKA CORPORATION (JP) 2023-03-16 US disclosed
CN-115052930-A Resin composition, laminate, method for producing same, electrode, secondary battery, and electric double layer capacitor 东丽株式会社 2022-09-13 CN disclosed
CN-110809607-B Resin composition, laminate, method for producing same, electrode, secondary battery, and electric double layer capacitor 东丽株式会社 2022-05-17 CN disclosed
CN-109792019-B Separator for nonaqueous electrolyte battery and nonaqueous electrolyte battery 东丽株式会社 2021-12-03 CN disclosed
CN-112955497-A Ultrathin polyimide film with improved dimensional stability and preparation method thereof 聚酰亚胺先端材料有限公司 2021-06-11 CN disclosed
WO-2021029243-A1 COLORED RESIN COMPOSITION, CURED PRODUCT AND LAMINATE 太陽ホールディングス株式会社 2021-02-18 WO disclosed
WO-2021028960-A1 COLORED RESIN COMPOSITION, CURED PRODUCT, AND LAMINATE 太陽ホールディングス株式会社 2021-02-18 WO disclosed
CN-108368259-B Resin composition 东丽株式会社 2020-11-20 CN disclosed
CN-110869848-A Laminated structure, dry film, and flexible printed circuit board 太阳油墨制造株式会社 2020-03-06 CN disclosed
EP-0217657-A2 Low-viscosity epoxy resin, resin composition containing it, and fibre-reinforced composite material containing cured product of the composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1987-04-08 EP disclosed
US-4656116-A CROSSLINKABLE SOLUTIONS OF SOLVENT, POLYIMIDE AND POLYAZIDE CHROMOGEN; PHOTORESISTS; PHOTOLITHOGRAPHY CIBA-GEIGY CORPORATION (US) 1987-04-07 US disclosed
EP-0214103-A2 Adhesively bonded photostructurable polyimide foil CIBA-GEIGY AG (CH) 1987-03-11 EP disclosed
US-4629777-A RADIATION-SENSITIVE, AUTOPHOTOCROSSLINKABLE; FILMS, COATINGS CIBA-GEIGY CORPORATION (US) 1986-12-16 US disclosed
EP-0200680-A2 Coated material and its use CIBA-GEIGY AG (CH) 1986-11-05 EP disclosed
EP-0181837-A2 Process for the manufacture of films and relief pictures from polyimides CIBA-GEIGY AG (CH) 1986-05-21 EP disclosed
US-4548891-A PHOTORESISTS; HEAT RESISTANCE; THICKNESS; SHARPNESS CIBA GEIGY CORPORATION (US) 1985-10-22 US disclosed
EP-0141781-A2 Light-sensitive coating composition and use thereof CIBA-GEIGY AG (CH) 1985-05-15 EP disclosed
EP-0134752-A1 Layered material and its use CIBA-GEIGY AG (CH) 1985-03-20 EP disclosed
EP-0132221-A1 Polyimide, process for its preparation and its use CIBA-GEIGY AG (CH) 1985-01-23 EP disclosed