SCHEMBL7150916

SCHEMBL7150916

C=COc1cccs1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4191923 0.82
SCHEMBL10638201 0.78
SCHEMBL4622035 0.77
SCHEMBL449835 0.76
SCHEMBL13665339 0.76
SCHEMBL28484470 0.76
SCHEMBL922357 0.76
SCHEMBL27791254 0.74
Formaldehyde SCHEMBL27805376 0.74 MMP1 (0.33)
SCHEMBL247102 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6627331-B1 Electroluminescent display based on electrochemically deposited polymer films and a method for constructing AGILENT TECHNOLOGIES, INC. 2003-09-30 US claimed
US-6552101-B1 Processor polymers for the electrochemical deposition of electrically conducting polymer films AGILENT TECHNOLOGIES, INC. 2003-04-22 US claimed
US-6533918-B2 Method for depositing electrically conducting polymer films via electrochemical deposition of precursor polymers AGILENT TECHNOLOGIES, INC. 2003-03-18 US claimed
US-20020011420-A1 Method for depositing electrically conducting polymer films via electrochemical deposition of precursor polymers AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. (SG) 2002-01-31 US claimed
US-6294245-B1 Method for depositing electrically conducting polymer films via electrochemical deposition of precursor polymers AGILENT TECHNOLOGIES, INC. 2001-09-25 US claimed
US-12623408-B2 Stereolithography with micron scale control of properties THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2026-05-12 US disclosed
EP-3962892-B1 PROCESS TO PRODUCE A MONO VINYL THIOETHER BASF SE (DE) 2023-06-07 EP disclosed
US-20220144767-A1 Process to produce a mono vinyl thioether BASF SE (DE) 2022-05-12 US disclosed
CN-113784949-A Process for preparing monovinyl sulfide 巴斯夫欧洲公司 2021-12-10 CN disclosed
US-20210229364-A1 STEREOLITHOGRAPHY WITH MICRON SCALE CONTROL OF PROPERTIES THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE 2021-07-29 US disclosed
WO-2020221607-A1 PROCESS TO PRODUCE A MONO VINYL THIOETHER BASF SE (DE) 2020-11-05 WO disclosed
US-9873769-B2 Thiolated PEG-PVA hydrogels CAMBRIDGE POLYMER GROUP, INC. (US) 2018-01-23 US disclosed
US-6533918-B2 Method for depositing electrically conducting polymer films via electrochemical deposition of precursor polymers AGILENT TECHNOLOGIES, INC. 2003-03-18 US disclosed
US-20020011420-A1 Method for depositing electrically conducting polymer films via electrochemical deposition of precursor polymers AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. (SG) 2002-01-31 US disclosed
US-20020011420-A1 Method for depositing electrically conducting polymer films via electrochemical deposition of precursor polymers AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. (SG) 2002-01-31 US disclosed
US-6294245-B1 Method for depositing electrically conducting polymer films via electrochemical deposition of precursor polymers AGILENT TECHNOLOGIES, INC. 2001-09-25 US disclosed
EP-0711813-B1 Antifouling coating composition HITACHI CHEMICAL CO LTD (JP) 2001-07-25 EP disclosed
CN-1295594-A Composition and method for producing polythioethers having pendent methyl chains PRC DISOTO INTERNAT CO (US) 2001-05-16 CN disclosed
US-5773508-A BIODEGRADABLE POLYMER OF ADDITION COPOLYMERS FOR PROTECTIVE COATINGS HITACHI CHEMICAL COMPANY, LTD. (JP) 1998-06-30 US disclosed
EP-0711813-A2 Coating varnish composition and antifouling coating composition Hitachi Chemical Co., Ltd. (JP) 1996-05-15 EP disclosed