Phosphoric Acid

Phosphoric Acid

SCHEMBL7154747

Cc1ccc(OP(=O)(Oc2ccc(C)cc2)Oc2ccc(C)cc2)cc1.O=P(O)(O)O

nearest known ligand 0.86

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 3/20 0.86
▸ CYP3A4 P08684 2/20 0.86
▸ ALDH1A1 P00352 1/20 0.52
▸ MAPK1 P28482 1/20 0.52
▸ TDP1 Q9NUW8 1/20 0.52
▸ LMNA P02545 4/20 0.48
▸ MEN1 O00255 4/20 0.43
▸ KMT2A Q03164 4/20 0.43
▸ MAPT P10636 1/20 0.43
▸ ACHE P22303 1/20 0.42
▸ PTK2B Q14289 1/20 0.42
▸ RXFP1 Q9HBX9 1/20 0.42
▸ NPSR1 Q6W5P4 1/20 0.42
▸ SRC P12931 1/20 0.41
▸ BLM P54132 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methyl Alcohol SCHEMBL27915032 0.93 TSHR (0.91) TSHRCYP3A4ALDH1A1MAPK1TDP1
SCHEMBL131412 0.93 TSHR (1.00) TSHRCYP3A4ALDH1A1MAPK1TDP1
SCHEMBL21582 0.93 TSHR (1.00) TSHRCYP3A4ALDH1A1MAPK1TDP1
SCHEMBL27393883 0.93 TSHR (1.00) TSHRCYP3A4ALDH1A1MAPK1TDP1
SCHEMBL10336991 0.93 TSHR (1.00) TSHRCYP3A4ALDH1A1MAPK1TDP1
SCHEMBL27371282 0.93 TSHR (1.00) TSHRCYP3A4ALDH1A1MAPK1TDP1
Phosphoric Acid SCHEMBL6848420 0.92 CYP3A4 (0.73) TSHRCYP3A4ALDH1A1MAPK1TDP1
Water SCHEMBL29287558 0.91 TSHR (0.95) TSHRCYP3A4ALDH1A1MAPK1TDP1
SCHEMBL9785893 0.91 CYP3A4 (0.95) TSHRCYP3A4ALDH1A1MAPK1TDP1
SCHEMBL8331868 0.91 TSHR (0.95) TSHRCYP3A4ALDH1A1MAPK1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023074086-A1 METHOD FOR PRODUCING CALCIUM CARBONATE 株式会社白石中央研究所 2023-05-04 — — WO disclosed
CN-106450232-A Preparation method and application of novel lithium ion battery cathode material namely ternary phosphate 武汉理工力强能源有限公司 2017-02-22 — — CN disclosed
CN-106318997-A Efficient preparation and purification method of thio- (seleno-) phosphoric acid cyclic di-nucleotide cGAMP 聊城市奥润生物医药科技有限公司 2017-01-11 — — CN disclosed
CN-103525354-B Light-curable sealant material composition ETERNAL CHEMICAL CO.,LTD. (CN) 2016-02-24 — — CN disclosed
CN-102898962-B Dual-curing adhesive composition ETERNAL CHEMICAL CO LTD 2015-04-29 — — CN disclosed
CN-103525354-A Light-curable sealant material composition ETERNAL CHEMICAL CO LTD 2014-01-22 — — CN disclosed
CN-102153953-B Photocurable adhesive composition ETERNAL CHEMICAL CO LTD 2013-11-13 — — CN disclosed
CN-102898962-A Dual-curing adhesive composition ETERNAL CHEMICAL INDUSTRY CO LTD 2013-01-30 — — CN disclosed
CN-102153953-A Photocurable adhesive composition ETERNAL CHEMICAL CO LTD 2011-08-17 — — CN disclosed
CN-100376630-C Resin composition for laser welding and molded article WINTECH POLYMER LTD (JP) 2008-03-26 — — CN disclosed
CN-1863870-A Resin composition for laser welding and molded article WINTECH POLYMER LTD (JP) 2006-11-15 — — CN disclosed
US-6545073-B1 Reacted with a basic salt forming compound; also contain carbonization auxiliaries, a metal-containing compound having a carbonization acceleration effect, a comb-like polymer and a filler. BLOUNT DAVID H (US) 2003-04-08 — — US disclosed
WO-1980002429-A1 IMPROVED HOT MELT ADHESIVE COMPOSITION DU PONT (US) 1980-11-13 — — WO disclosed
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