Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Potassium Ion SCHEMBL7767662 | 0.96 | MEN1 (0.31) | MEN1ALDH1A1TSHRKMT2A | |
| SCHEMBL6545746 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 | |
| SCHEMBL2337584 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 | |
| SCHEMBL17513048 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 | |
| SCHEMBL20580570 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 | |
| SCHEMBL14801789 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 | |
| SCHEMBL3081554 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 | |
| SCHEMBL20580451 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 | |
| SCHEMBL20580373 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 | |
| SCHEMBL20580471 | 0.91 | MEN1 (0.33) | MEN1ALDH1A1TSHRKMT2ACA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118062809-B | Preparation method of sodium chlorite | 山东高密高源化工有限公司 | 2024-06-21 | — | — | CN | disclosed |
| CN-118062809-A | Preparation method of sodium chlorite | 山东高密高源化工有限公司 | 2024-05-24 | — | — | CN | disclosed |
| WO-2022231005-A1 | OXIDATION HAIR DYE, FIRST AGENT FOR OXIDATION HAIR DYE, AND USAGE METHOD FOR OXIDATION HAIR DYE | ホーユー株式会社 | 2022-11-03 | — | — | WO | disclosed |
| WO-2022163228-A1 | COMPOSITION FOR HAIR BLEACHING/DEDYEING OR HAIR DYEING | ホーユー株式会社 | 2022-08-04 | — | — | WO | disclosed |
| WO-2021241231-A1 | SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD, METHOD FOR GENERATING TRAINING DATA, LEARNING METHOD, LEARNING DEVICE, METHOD FOR GENERATING TRAINED MODEL, AND TRAINED MODEL | 株式会社ＳＣＲＥＥＮホールディングス | 2021-12-02 | — | — | WO | disclosed |
| CN-108852877-A | The tone stabilization method of hair coloring preparation composition and hair coloring preparation composition | 朋友株式会社 | 2018-11-23 | — | — | CN | disclosed |
| CN-108852891-A | The tone stabilization method of first dose of oxide hair dye and oxide hair dye composition | 朋友株式会社 | 2018-11-23 | — | — | CN | disclosed |
| US-8778778-B2 | Manufacturing method of semiconductor device, semiconductor substrate, and camera module | KABUSHIKI KAISHA TOSHIBA (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20120049312-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR SUBSTRATE, AND CAMERA MODULE | KABUSHIKI KAISHA TOSHIBA (JP) | 2012-03-01 | — | — | US | disclosed |
| US-8022486-B2 | CMOS semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-09-20 | — | — | US | disclosed |
| US-20090014809-A1 | Semiconductor device and method for manufacturing the same | MICROSOFT TECHNOLOGY LICENSING, LLC | 2009-01-15 | — | — | US | disclosed |
| CN-101184472-A | Oxide hair dye composition | HOYU K K (JP) | 2008-05-21 | — | — | CN | disclosed |
| US-20070034401-A1 | Circuit board and manufacturing method thereof | SAMSUNG ELECTRONICS CO., LTD. | 2007-02-15 | — | — | US | disclosed |
| JP-2006299068-A | CHEMICAL SUBSTANCE-DECOMPOSING AGENT AND CLEANING METHOD USING THE SAME | ADEKA CORP | 2006-11-02 | — | — | JP | disclosed |
| EP-0999264-B1 | POWDERY DETERGENT COMPOSITION | KAO CORP (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-6265371-B1 | E.G., DISODIUM SALT OF N,N-BIS(CARBOXYMETHYL)-2-AMINOPENTANDIOIC ACID | KAO CORPORATION (JP) | 2001-07-24 | — | — | US | disclosed |
| EP-0999264-A1 | POWDERY DETERGENT COMPOSITION | Kao Corporation (JP) | 2000-05-10 | — | — | EP | disclosed |
| US-5998302-A | Method of manufacturing semiconductor device | SONY CORPORATION (JP) | 1999-12-07 | — | — | US | disclosed |
| US-5955761-A | Semiconductor device and manufacturing method thereof | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-09-21 | — | — | US | disclosed |
| US-5780901-A | Semiconductor device with side wall conductor film | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-07-14 | — | — | US | disclosed |