Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 4/20 | 0.37 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.33 |
| ▸ | PDE4A | P27815 | 1/20 | 0.33 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL992168 | 0.98 | APP (0.42) | APPALDH1A1TSHRHTTLMNA | |
| SCHEMBL21184487 | 0.93 | TSHR (0.40) | APPALDH1A1TSHRHTTLMNA | |
| SCHEMBL9452241 | 0.93 | TSHR (0.40) | APPALDH1A1TSHRHTTLMNA | |
| SCHEMBL6599060 | 0.91 | APP (0.41) | APPALDH1A1TSHRHTTLMNA | |
| SCHEMBL8740085 | 0.89 | APP (0.39) | APPALDH1A1TSHRHTTLMNA | |
| SCHEMBL14114301 | 0.87 | ALDH1A1 (0.39) | APPALDH1A1TSHRHTTLMNA | |
| SCHEMBL13804841 | 0.87 | ALDH1A1 (0.39) | APPALDH1A1TSHRHTTLMNA | |
| SCHEMBL8604974 | 0.86 | ALDH1A1 (0.42) | APPALDH1A1TSHRHTTLMNA | |
| SCHEMBL4731267 | 0.85 | APP (0.48) | APPLMNAPTGS1PDE4ASLC6A6 | |
| SCHEMBL19640302 | 0.85 | APP (0.48) | APPLMNAPTGS1PDE4ASLC6A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024237073-A1 | SILICA FINE PARTICLE DISPERSION FOR POLISHING, COMPOSITION FOR POLISHING, AND METHOD FOR PRODUCING SILICA FINE PARTICLE DISPERSION FOR POLISHING | 日揮触媒化成株式会社 | 2024-11-21 | — | — | WO | disclosed |
| US-11891307-B2 | Silica-based particle dispersion and production method therefor | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2024-02-06 | — | — | US | disclosed |
| EP-3539926-B1 | CERIA COMPOSITE PARTICLE DISPERSION, METHOD FOR PRODUCING SAME, AND POLISHING ABRASIVE GRAIN DISPERSION COMPRISING CERIA COMPOSITE PARTICLE DISPERSION | JGC CATALYSTS & CHEMICALS LTD (JP) | 2023-07-12 | — | — | EP | disclosed |
| EP-3447790-B1 | SILICA-BASED COMPOSITE FINE PARTICLE DISPERSION AND METHOD FOR MANUFACTURING SAME | JGC CATALYSTS & CHEMICALS LTD (JP) | 2023-05-24 | — | — | EP | disclosed |
| CN-109937187-B | Cerium oxide-based composite microparticle dispersion, method for producing same, and abrasive particle dispersion for polishing containing cerium oxide-based composite microparticle dispersion | 日挥触媒化成株式会社 | 2022-08-09 | — | — | CN | disclosed |
| US-20220055908-A1 | SILICA-BASED PARTICLE DISPERSION AND PRODUCTION METHOD THEREFOR | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2022-02-24 | — | — | US | disclosed |
| CN-110177852-B | Polishing composition | 日挥触媒化成株式会社 | 2021-12-14 | — | — | CN | disclosed |
| US-11059997-B2 | Polishing composition | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-10920120-B2 | Ceria composite particle dispersion, method for producing same, and polishing abrasive grain dispersion comprising ceria composite particle dispersion | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| CN-107428544-B | Silica-based composite fine particle dispersion, method for producing same, and polishing slurry containing silica-based composite fine particle dispersion | 日挥触媒化成株式会社 | 2020-12-04 | — | — | CN | disclosed |
| EP-1642949-A1 | Polishing composition and method of polishing with the same | Fuji Photo Film Co., Ltd. (JP) | 2006-04-05 | — | — | EP | disclosed |
| US-20060000808-A1 | Polishing solution of metal and chemical mechanical polishing method | FUJI PHOTO FILM CO., LTD. | 2006-01-05 | — | — | US | disclosed |
| US-20050191823-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-09-01 | — | — | US | disclosed |
| EP-1568746-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-6899821-B2 | Abrasive liquid for metal and method for polishing | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2005-05-31 | — | — | US | disclosed |
| US-6896825-B1 | Abrasive liquid for metal and method for polishing | HITACHI CHEMICAL COMPANY, LTD (JP) | 2005-05-24 | — | — | US | disclosed |
| US-20050095860-A1 | Abrasive liquid for metal and method for polishing | RENESAS ELECTRONICS CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20020017630-A1 | Abrasive liquid for metal and method for polishing | RENESAS ELECTRONICS CORPORATION (JP) | 2002-02-14 | — | — | US | disclosed |
| EP-1150341-A1 | MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR METAL, METHOD FOR PREPARATION THEREOF AND POLISHING METHOD USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-10-31 | — | — | EP | disclosed |
| EP-1137056-A1 | ABRASIVE LIQUID FOR METAL AND METHOD FOR POLISHING | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-09-26 | — | — | EP | disclosed |