SCHEMBL7160776

SCHEMBL7160776

NCCC1OCC2(CO1)COC(CCN)OC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15559 0.85
Hydrochloric Acid SCHEMBL8854299 0.83
SCHEMBL11678356 0.83 SIGMAR1 (0.35)
SCHEMBL11682072 0.81 SIGMAR1 (0.39)
SCHEMBL11681070 0.81 SIGMAR1 (0.39)
SCHEMBL11680577 0.81 SIGMAR1 (0.39)
SCHEMBL11653073 0.78 MEN1 (0.31)
SCHEMBL2907195 0.77
SCHEMBL13682862 0.77 ALDH1A1 (0.36)
SCHEMBL712450 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4062799-A SPIROACETAL DIAMINE FUJI PHOTO FILM CO., LTD. (JA) 1977-12-13 US claimed
US-3996156-A BONDING A SPIROACETAL HETEROCYCLIC DIAMINE WITH AN ORGANIC COMPOUND FUJI PHOTO FILM CO., LTD. (JA) 1976-12-07 US claimed
US-6593419-B2 Polycarbonateurethane made from polyisocyanate, spiro ring compound, and polycarbonate polyol; synthetic leather DAINIPPON INK AND CHEMICALS, INC. (JP) 2003-07-15 US disclosed
US-20030092832-A1 Polyurethane resin and method for producing the same, resin composition and sheet-form article DAINIPPON INK AND CHEMICALS, INC. (JP) 2003-05-15 US disclosed
US-4062799-A SPIROACETAL DIAMINE FUJI PHOTO FILM CO., LTD. (JA) 1977-12-13 US disclosed
US-3996156-A BONDING A SPIROACETAL HETEROCYCLIC DIAMINE WITH AN ORGANIC COMPOUND FUJI PHOTO FILM CO., LTD. (JA) 1976-12-07 US disclosed