Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL713217 | 1.00 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL715364 | 1.00 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL712408 | 1.00 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL714357 | 1.00 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL713038 | 1.00 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL403954 | 1.00 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL720226 | 1.00 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL715943 | 1.00 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| Water SCHEMBL15939211 | 0.98 | TSHR (0.38) | TSHRKDM4ETDP1USP2MAPT | |
| Ammonia Solution, Strong SCHEMBL6997853 | 0.98 | TSHR (0.38) | TSHRKDM4ETDP1USP2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240150204-A1 | BIAS ENHANCED ELECTROLYTIC PHOTOCATALYSIS (BEEP) CLEANING SYSTEM | Waterdrape, LLC | 2024-05-09 | — | — | US | disclosed |
| US-11919786-B2 | Bias enhanced electrolytic photocatalysis (BEEP) cleaning system | Waterdrape, LLC (US) | 2024-03-05 | — | — | US | disclosed |
| US-20230113314-A1 | BIAS ENHANCED ELECTROLYTIC PHOTOCATALYSIS (BEEP) CLEANING SYSTEM | Waterdrape, LLC | 2023-04-13 | — | — | US | disclosed |
| WO-2022265913-A1 | COPOLYMERS AND ELECTROCHEMICAL SYSTEMS AND METHODS FOR THE REMEDIATION OF ORGANIC POLLUTANTS | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (US) | 2022-12-22 | — | — | WO | disclosed |
| US-11123950-B2 | Artificial leather sheet and method for manufacturing thereof | Kolon Giotech, Inc. (KR) | 2021-09-21 | — | — | US | disclosed |
| US-20190255806-A1 | ARTIFICIAL LEATHER SHEET AND METHOD FOR MANUFACTURING THEREOF | KOLON INDUSTRIES, INC. (KR) | 2019-08-22 | — | — | US | disclosed |
| US-9447314-B2 | Treatment fluids containing a perfluorinated chelating agent and methods for use thereof | HALLIBURTON ENERGY SERVICES, INC. (US) | 2016-09-20 | — | — | US | disclosed |
| US-20160237339-A1 | TREATMENT FLUIDS CONTAINING A PERFLUORINATED CHELATING AGENT AND METHODS FOR USE THEREOF | HALLIBURTON ENERGY SERVICES, INC. (US) | 2016-08-18 | — | — | US | disclosed |
| WO-2015053753-A1 | TREATMENT FLUIDS CONTAINING A PERFLUORINATED CHELATING AGENT AND METHODS FOR USE THEREOF | HALLIBURTON ENERGY SERVICES, INC. (US) | 2015-04-16 | — | — | WO | disclosed |
| US-8357765-B2 | Process for producing catalyst component for addition polymerization | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-22 | — | — | US | disclosed |
| US-7690301-B2 | including a cationically polymerizable compound, a compound that generates acid by irradiation with a radiation ray, and a basic compound that becomes less basic by irradiation with a radiation ray; curable with high sensitivity to a radiation ray | FUJIFILM CORPORATION (JP) | 2010-04-06 | — | — | US | disclosed |
| US-7521168-B2 | Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. | FUJIFILM CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20090035692-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214467-B2 | Photosensitive resin composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7202015-B2 | Positive photoresist composition and pattern making method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7198880-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-04-03 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |