Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CASP1 | P29466 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.40 |
| ▸ | MEN1 | O00255 | 4/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.40 |
| ▸ | MAPT | P10636 | 5/20 | 0.40 |
| ▸ | HPGD | P15428 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | CASP3 | P42574 | 1/20 | 0.37 |
| ▸ | VDR | P11473 | 2/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.35 |
| ▸ | CDC25B | P30305 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.34 |
| ▸ | F2 | P00734 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27861906 | 0.85 | ERCC1 (0.46) | KMT2AMEN1KDM4EMAPTHPGD | |
| SCHEMBL3877590 | 0.75 | KDM4E (0.53) | CASP1KMT2AMEN1KDM4EMAPT | |
| SCHEMBL8423045 | 0.75 | CASP1 (0.42) | CASP1KMT2AMEN1KDM4EMAPT | |
| SCHEMBL30643544 | 0.75 | CASP1 (0.42) | CASP1KMT2AMEN1KDM4EMAPT | |
| SCHEMBL27977897 | 0.74 | MEN1 (0.40) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL21034093 | 0.71 | CASP3 (0.45) | CASP1KMT2AMEN1KDM4EMAPT | |
| SCHEMBL31229117 | 0.71 | CASP3 (0.48) | KMT2AMEN1KDM4EMAPTHPGD | |
| SCHEMBL8452187 | 0.71 | CASP3 (0.48) | KMT2AMEN1KDM4EMAPTHPGD | |
| SCHEMBL11871269 | 0.70 | KMT2A (0.47) | KMT2AMEN1KDM4EMAPTHPGD | |
| SCHEMBL22954047 | 0.68 | GAA (0.47) | CASP1KMT2AMEN1KDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6566036-B2 | Comprising polyhydroxystyrene protected by 1-ethoxyethanol, photosensitive acid generator, solvent and polystyrene filler; dimensional and shape control of semiconductors; responsive to design rule of <0.15mu m; miniaturization | NEC ELECTRONICS CORPORATION (JP) | 2003-05-20 | — | — | US | claimed |
| US-20010009749-A1 | Chemically amplified resist | NEC CORPORATION | 2001-07-26 | — | — | US | claimed |
| US-6566036-B2 | Comprising polyhydroxystyrene protected by 1-ethoxyethanol, photosensitive acid generator, solvent and polystyrene filler; dimensional and shape control of semiconductors; responsive to design rule of <0.15mu m; miniaturization | NEC ELECTRONICS CORPORATION (JP) | 2003-05-20 | — | — | US | disclosed |
| US-20010009749-A1 | Chemically amplified resist | NEC CORPORATION | 2001-07-26 | — | — | US | disclosed |
| US-5633112-A | Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine | HITACHI, LTD. (JP) | 1997-05-27 | — | — | US | disclosed |